Effect of Continuous-to-Discontinuous Layer Transition on the Interface Evolution and Dielectric Response in Subnanometric Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> Laminates Grown by Atomic Layer Deposition.
- DOI
- 10.1021/acsami.6c05777
- Published
- 2026-05-27
- Container
- ACS Appl Mater Interfaces
- Publisher
- Not recorded
- Open access
- no
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Cite this work
BibTeX
@article{allodium:10.1021/acsami.6c05777,
title = {Effect of Continuous-to-Discontinuous Layer Transition on the Interface Evolution and Dielectric Response in Subnanometric Al\<sub\>2\</sub\>O\<sub\>3\</sub\>/TiO\<sub\>2\</sub\> Laminates Grown by Atomic Layer Deposition.},
author = {Padhi PS and Rai SK and Goutam UK and Ajimsha RS and Verma S and Misra P.},
year = {2026},
journal = {ACS Appl Mater Interfaces},
doi = {10.1021/acsami.6c05777},
url = {https://doi.org/10.1021/acsami.6c05777}
}RIS
TY - JOUR TI - Effect of Continuous-to-Discontinuous Layer Transition on the Interface Evolution and Dielectric Response in Subnanometric Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> Laminates Grown by Atomic Layer Deposition. AU - Padhi PS AU - Rai SK AU - Goutam UK AU - Ajimsha RS AU - Verma S AU - Misra P. PY - 2026 JO - ACS Appl Mater Interfaces DO - 10.1021/acsami.6c05777 UR - https://doi.org/10.1021/acsami.6c05777 ER -
APA
PS, P., SK, R., UK, G., RS, A., S, V., & P., M. (2026). Effect of Continuous-to-Discontinuous Layer Transition on the Interface Evolution and Dielectric Response in Subnanometric Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> Laminates Grown by Atomic Layer Deposition.. ACS Appl Mater Interfaces. https://doi.org/10.1021/acsami.6c05777
Source records
- europe-pmc · retrieved 2026-11-10T11:37:41.858Z