Simulation-Guided Atomic Layer Deposition Enables Deterministic Interfacial Mechanics for Predictive Nanoimprint Lithography.
- DOI
- 10.1021/acsami.6c10450
- Published
- 2026 Aug 5
- Container
- ACS applied materials & interfaces
- Publisher
- Not recorded
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1021/acsami.6c10450,
title = {Simulation-Guided Atomic Layer Deposition Enables Deterministic Interfacial Mechanics for Predictive Nanoimprint Lithography.},
author = {Chen C and Li J and Jiang Y and Song H and Li M and Jiang H and Wang L and Xing Y and Liu S and Tan X and Fang W and Li Z},
year = {2026},
journal = {ACS applied materials \& interfaces},
doi = {10.1021/acsami.6c10450},
url = {https://doi.org/10.1021/acsami.6c10450}
}RIS
TY - JOUR TI - Simulation-Guided Atomic Layer Deposition Enables Deterministic Interfacial Mechanics for Predictive Nanoimprint Lithography. AU - Chen C AU - Li J AU - Jiang Y AU - Song H AU - Li M AU - Jiang H AU - Wang L AU - Xing Y AU - Liu S AU - Tan X AU - Fang W AU - Li Z PY - 2026 JO - ACS applied materials & interfaces DO - 10.1021/acsami.6c10450 UR - https://doi.org/10.1021/acsami.6c10450 ER -
APA
C, C., J, L., Y, J., H, S., M, L., H, J., L, W., Y, X., S, L., X, T., W, F., & Z, L. (2026). Simulation-Guided Atomic Layer Deposition Enables Deterministic Interfacial Mechanics for Predictive Nanoimprint Lithography.. ACS applied materials & interfaces. https://doi.org/10.1021/acsami.6c10450
Source records
- pubmed · retrieved 2026-09-26T01:04:09.742Z