Simulation-Guided Atomic Layer Deposition Enables Deterministic Interfacial Mechanics for Predictive Nanoimprint Lithography
- DOI
- 10.1021/acsami.6c10450
- Published
- 2026-07-07
- Container
- ACS Applied Materials & Interfaces
- Publisher
- American Chemical Society (ACS)
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1021/acsami.6c10450,
title = {Simulation-Guided
Atomic Layer Deposition Enables
Deterministic Interfacial Mechanics for Predictive Nanoimprint Lithography},
author = {Chaoyu Chen and Jiulong Li and Youquan Jiang and Haonan Song and Mingtan Li and Huiyun Jiang and Lirong Wang and Yanjun Xing and Sheng Liu and Xinfeng Tan and Wenzhang Fang and Zhaodong Li},
year = {2026},
journal = {ACS Applied Materials \&
Interfaces},
doi = {10.1021/acsami.6c10450},
url = {https://doi.org/10.1021/acsami.6c10450}
}RIS
TY - JOUR TI - Simulation-Guided Atomic Layer Deposition Enables Deterministic Interfacial Mechanics for Predictive Nanoimprint Lithography AU - Chaoyu Chen AU - Jiulong Li AU - Youquan Jiang AU - Haonan Song AU - Mingtan Li AU - Huiyun Jiang AU - Lirong Wang AU - Yanjun Xing AU - Sheng Liu AU - Xinfeng Tan AU - Wenzhang Fang AU - Zhaodong Li PY - 2026 JO - ACS Applied Materials & Interfaces DO - 10.1021/acsami.6c10450 UR - https://doi.org/10.1021/acsami.6c10450 ER -
APA
Chen, C., Li, J., Jiang, Y., Song, H., Li, M., Jiang, H., Wang, L., Xing, Y., Liu, S., Tan, X., Fang, W., & Li, Z. (2026). Simulation-Guided Atomic Layer Deposition Enables Deterministic Interfacial Mechanics for Predictive Nanoimprint Lithography. ACS Applied Materials & Interfaces. https://doi.org/10.1021/acsami.6c10450
Source records
- crossref · retrieved 2026-11-10T14:53:12.921Z