Toward Robust InP Laser Lift-Off: Energy-Dependent Absorption Shift and Self-Absorption under Single-Pulse 1064 nm Irradiation
- DOI
- 10.1021/acsami.6c11857
- Published
- 2026-10-23
- Container
- ACS Applied Materials & Interfaces
- Publisher
- American Chemical Society (ACS)
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1021/acsami.6c11857,
title = {Toward Robust InP Laser Lift-Off: Energy-Dependent Absorption Shift and Self-Absorption under Single-Pulse 1064 nm Irradiation},
author = {Yusheng Yang and Katinka Weynants and François Chancerel and Steven Brems and Reynald Alcotte and Rachid Haouari and Willem Van Roy and Patrick Carolan and Clement Merckling},
year = {2026},
journal = {ACS Applied Materials \& Interfaces},
doi = {10.1021/acsami.6c11857},
url = {https://doi.org/10.1021/acsami.6c11857}
}RIS
TY - JOUR TI - Toward Robust InP Laser Lift-Off: Energy-Dependent Absorption Shift and Self-Absorption under Single-Pulse 1064 nm Irradiation AU - Yusheng Yang AU - Katinka Weynants AU - François Chancerel AU - Steven Brems AU - Reynald Alcotte AU - Rachid Haouari AU - Willem Van Roy AU - Patrick Carolan AU - Clement Merckling PY - 2026 JO - ACS Applied Materials & Interfaces DO - 10.1021/acsami.6c11857 UR - https://doi.org/10.1021/acsami.6c11857 ER -
APA
Yang, Y., Weynants, K., Chancerel, F., Brems, S., Alcotte, R., Haouari, R., Roy, W. V., Carolan, P., & Merckling, C. (2026). Toward Robust InP Laser Lift-Off: Energy-Dependent Absorption Shift and Self-Absorption under Single-Pulse 1064 nm Irradiation. ACS Applied Materials & Interfaces. https://doi.org/10.1021/acsami.6c11857
Source records
- crossref · retrieved 2026-11-08T02:50:57.970Z