Dry Mask Transfer Lithography for High-Resolution Patterning of Nanomaterials and Molecular Interfaces on Arbitrary Substrates
- DOI
- 10.1021/acsami.6c13121
- Published
- 2026-10-12
- Container
- ACS Applied Materials & Interfaces
- Publisher
- American Chemical Society (ACS)
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1021/acsami.6c13121,
title = {Dry Mask Transfer Lithography for High-Resolution Patterning of Nanomaterials and Molecular Interfaces on Arbitrary Substrates},
author = {Na Yoon Kim and Kyeong Jun Park and Junhyung Kim and Seok Kim and Jaehyung Yu and Hoe Joon Kim and Hohyun Keum},
year = {2026},
journal = {ACS Applied Materials \& Interfaces},
doi = {10.1021/acsami.6c13121},
url = {https://doi.org/10.1021/acsami.6c13121}
}RIS
TY - JOUR TI - Dry Mask Transfer Lithography for High-Resolution Patterning of Nanomaterials and Molecular Interfaces on Arbitrary Substrates AU - Na Yoon Kim AU - Kyeong Jun Park AU - Junhyung Kim AU - Seok Kim AU - Jaehyung Yu AU - Hoe Joon Kim AU - Hohyun Keum PY - 2026 JO - ACS Applied Materials & Interfaces DO - 10.1021/acsami.6c13121 UR - https://doi.org/10.1021/acsami.6c13121 ER -
APA
Kim, N. Y., Park, K. J., Kim, J., Kim, S., Yu, J., Kim, H. J., & Keum, H. (2026). Dry Mask Transfer Lithography for High-Resolution Patterning of Nanomaterials and Molecular Interfaces on Arbitrary Substrates. ACS Applied Materials & Interfaces. https://doi.org/10.1021/acsami.6c13121
Source records
- crossref · retrieved 2026-11-08T04:28:02.513Z