Robust Anomalous Hall Effect in Epitaxial Cubic D03-Fe3Ge Nanoplates Grown via Chemical Vapor Deposition
- DOI
- 10.1021/acsami.6c14914
- Published
- 2026-10-21
- Container
- ACS Applied Materials & Interfaces
- Publisher
- American Chemical Society (ACS)
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1021/acsami.6c14914,
title = {Robust Anomalous Hall Effect in Epitaxial Cubic D03-Fe3Ge Nanoplates Grown via Chemical Vapor Deposition},
author = {Mingxuan Chen and Chao Chen and Siqi Jiang and Shuxiang Qiao and Hongyan Lu and Di Zhang and Jiabei Huang and Fuzhuo Lian and Zhaochen Qu and Siqin Wang and Ziyi Wang and Shuai Zhang and Yulu Liu and Ronghua Liu and Xiaoxiang Xi and Renjun Du and Lei Wang and Geliang Yu},
year = {2026},
journal = {ACS Applied Materials \& Interfaces},
doi = {10.1021/acsami.6c14914},
url = {https://doi.org/10.1021/acsami.6c14914}
}RIS
TY - JOUR TI - Robust Anomalous Hall Effect in Epitaxial Cubic D03-Fe3Ge Nanoplates Grown via Chemical Vapor Deposition AU - Mingxuan Chen AU - Chao Chen AU - Siqi Jiang AU - Shuxiang Qiao AU - Hongyan Lu AU - Di Zhang AU - Jiabei Huang AU - Fuzhuo Lian AU - Zhaochen Qu AU - Siqin Wang AU - Ziyi Wang AU - Shuai Zhang AU - Yulu Liu AU - Ronghua Liu AU - Xiaoxiang Xi AU - Renjun Du AU - Lei Wang AU - Geliang Yu PY - 2026 JO - ACS Applied Materials & Interfaces DO - 10.1021/acsami.6c14914 UR - https://doi.org/10.1021/acsami.6c14914 ER -
APA
Chen, M., Chen, C., Jiang, S., Qiao, S., Lu, H., Zhang, D., Huang, J., Lian, F., Qu, Z., Wang, S., Wang, Z., Zhang, S., Liu, Y., Liu, R., Xi, X., Du, R., Wang, L., & Yu, G. (2026). Robust Anomalous Hall Effect in Epitaxial Cubic D03-Fe3Ge Nanoplates Grown via Chemical Vapor Deposition. ACS Applied Materials & Interfaces. https://doi.org/10.1021/acsami.6c14914
Source records
- crossref · retrieved 2026-11-10T10:12:39.847Z