Stacking-Sequence Engineering of Functional Metal Bilayers for Rapid Direct-Contact Prelithiation of SiOx Anodes

Po-Wei Liu, Yi-Fan Chiang, Tsai-Fu Chung, Yu-Sheng Su

Open source

DOI: 10.1021/acsami.6c16367
Published: 2026-11-06
Container: ACS Applied Materials & Interfaces
Publisher: American Chemical Society (ACS)
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1021/acsami.6c16367,
  title = {Stacking-Sequence Engineering of Functional Metal Bilayers for Rapid Direct-Contact Prelithiation of SiOx Anodes},
  author = {Po-Wei Liu and Yi-Fan Chiang and Tsai-Fu Chung and Yu-Sheng Su},
  year = {2026},
  journal = {ACS Applied Materials \&amp; Interfaces},
  doi = {10.1021/acsami.6c16367},
  url = {https://doi.org/10.1021/acsami.6c16367}
}

RIS

TY  - JOUR
TI  - Stacking-Sequence Engineering of Functional Metal Bilayers for Rapid Direct-Contact Prelithiation of SiOx Anodes
AU  - Po-Wei Liu
AU  - Yi-Fan Chiang
AU  - Tsai-Fu Chung
AU  - Yu-Sheng Su
PY  - 2026
JO  - ACS Applied Materials &amp; Interfaces
DO  - 10.1021/acsami.6c16367
UR  - https://doi.org/10.1021/acsami.6c16367
ER  -

APA

Liu, P., Chiang, Y., Chung, T., & Su, Y. (2026). Stacking-Sequence Engineering of Functional Metal Bilayers for Rapid Direct-Contact Prelithiation of SiOx Anodes. ACS Applied Materials & Interfaces. https://doi.org/10.1021/acsami.6c16367

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crossref · retrieved 2026-11-09T18:55:13.700Z