Tunable Positive/Negative Tone Switching in Sn-Based Extreme Ultraviolet Lithography Dry Resists: Mechanism and Sub-7 nm Patterning
- DOI
- 10.1021/acsami.6c17078
- Published
- 2026-09-18
- Container
- ACS Applied Materials & Interfaces
- Publisher
- American Chemical Society (ACS)
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1021/acsami.6c17078,
title = {Tunable Positive/Negative Tone Switching in Sn-Based Extreme Ultraviolet Lithography Dry Resists: Mechanism and Sub-7 nm Patterning},
author = {Xingkun Wang and Chen Zhu and Yutao Xu and Jianan Xie and Miao Meng and Hong Dong and Jincheng Liu and Xiaolei Sun and Feng Luo},
year = {2026},
journal = {ACS Applied Materials \& Interfaces},
doi = {10.1021/acsami.6c17078},
url = {https://doi.org/10.1021/acsami.6c17078}
}RIS
TY - JOUR TI - Tunable Positive/Negative Tone Switching in Sn-Based Extreme Ultraviolet Lithography Dry Resists: Mechanism and Sub-7 nm Patterning AU - Xingkun Wang AU - Chen Zhu AU - Yutao Xu AU - Jianan Xie AU - Miao Meng AU - Hong Dong AU - Jincheng Liu AU - Xiaolei Sun AU - Feng Luo PY - 2026 JO - ACS Applied Materials & Interfaces DO - 10.1021/acsami.6c17078 UR - https://doi.org/10.1021/acsami.6c17078 ER -
APA
Wang, X., Zhu, C., Xu, Y., Xie, J., Meng, M., Dong, H., Liu, J., Sun, X., & Luo, F. (2026). Tunable Positive/Negative Tone Switching in Sn-Based Extreme Ultraviolet Lithography Dry Resists: Mechanism and Sub-7 nm Patterning. ACS Applied Materials & Interfaces. https://doi.org/10.1021/acsami.6c17078
Source records
- crossref · retrieved 2026-09-25T04:33:40.263Z