Selective SnO<sub><i>x</i></sub> Atomic Layer Deposition Driven by Oxygen Reactants

Jung-Hoon Lee, Mi Yoo, DongHee Kang, Hyun-Mo Lee, Wan-ho Choi, Jung Woo Park, Yeonjin Yi, Hyun You Kim, Jin-Seong Park

Open source

DOI
10.1021/acsami.8b12251
Published
2018-09-10
Container
ACS Applied Materials &amp; Interfaces
Publisher
American Chemical Society (ACS)
Open access
unknown

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BibTeX

@article{allodium:10.1021/acsami.8b12251,
  title = {Selective SnO<sub><i>x</i></sub> Atomic Layer Deposition Driven by Oxygen Reactants},
  author = {Jung-Hoon Lee and Mi Yoo and DongHee Kang and Hyun-Mo Lee and Wan-ho Choi and Jung Woo Park and Yeonjin Yi and Hyun You Kim and Jin-Seong Park},
  year = {2018},
  journal = {ACS Applied Materials \&amp; Interfaces},
  doi = {10.1021/acsami.8b12251},
  url = {https://doi.org/10.1021/acsami.8b12251}
}

RIS

TY  - JOUR
TI  - Selective SnO<sub><i>x</i></sub> Atomic Layer Deposition Driven by Oxygen Reactants
AU  - Jung-Hoon Lee
AU  - Mi Yoo
AU  - DongHee Kang
AU  - Hyun-Mo Lee
AU  - Wan-ho Choi
AU  - Jung Woo Park
AU  - Yeonjin Yi
AU  - Hyun You Kim
AU  - Jin-Seong Park
PY  - 2018
JO  - ACS Applied Materials &amp; Interfaces
DO  - 10.1021/acsami.8b12251
UR  - https://doi.org/10.1021/acsami.8b12251
ER  - 

APA

Lee, J., Yoo, M., Kang, D., Lee, H., Choi, W., Park, J. W., Yi, Y., Kim, H. Y., & Park, J. (2018). Selective SnO<sub><i>x</i></sub> Atomic Layer Deposition Driven by Oxygen Reactants. ACS Applied Materials &amp; Interfaces. https://doi.org/10.1021/acsami.8b12251

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