Ultrafast and Resist-Free Nanopatterning of 2D Materials by Femtosecond Laser Irradiation
- DOI
- 10.1021/acsnano.2c09501
- Published
- 2023-04-19
- Container
- ACS Nano
- Publisher
- American Chemical Society (ACS)
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1021/acsnano.2c09501,
title = {Ultrafast and Resist-Free Nanopatterning of 2D Materials by Femtosecond Laser Irradiation},
author = {Alessandro Enrico and Oliver Hartwig and Nikolas Dominik and Arne Quellmalz and Kristinn B. Gylfason and Georg S. Duesberg and Frank Niklaus and Göran Stemme},
year = {2023},
journal = {ACS Nano},
doi = {10.1021/acsnano.2c09501},
url = {https://doi.org/10.1021/acsnano.2c09501}
}RIS
TY - JOUR TI - Ultrafast and Resist-Free Nanopatterning of 2D Materials by Femtosecond Laser Irradiation AU - Alessandro Enrico AU - Oliver Hartwig AU - Nikolas Dominik AU - Arne Quellmalz AU - Kristinn B. Gylfason AU - Georg S. Duesberg AU - Frank Niklaus AU - Göran Stemme PY - 2023 JO - ACS Nano DO - 10.1021/acsnano.2c09501 UR - https://doi.org/10.1021/acsnano.2c09501 ER -
APA
Enrico, A., Hartwig, O., Dominik, N., Quellmalz, A., Gylfason, K. B., Duesberg, G. S., Niklaus, F., & Stemme, G. (2023). Ultrafast and Resist-Free Nanopatterning of 2D Materials by Femtosecond Laser Irradiation. ACS Nano. https://doi.org/10.1021/acsnano.2c09501
Source records
- crossref · retrieved 2026-09-27T02:04:16.866Z