High-Resolution Patterning of Breathable Polymer Nanomesh via Double-Side UV Exposure for Fabricating Micropatterned Wearable Devices.

Bae J, Song CM, Kumar PS, Jang G, Choi H, Hwang S, Shin J, Kim S, Do J, Kim M, Kim YW, Kim C, You CY, Min Y, Roh JW, Kwon HJ, Lee S

Open source

DOI: 10.1021/acsnano.4c18934
Published: 2025 May 6
Container: ACS nano
Publisher: Not recorded
Open access: no

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Cite this work

BibTeX

@article{allodium:10.1021/acsnano.4c18934,
  title = {High-Resolution Patterning of Breathable Polymer Nanomesh via Double-Side UV Exposure for Fabricating Micropatterned Wearable Devices.},
  author = {Bae J and Song CM and Kumar PS and Jang G and Choi H and Hwang S and Shin J and Kim S and Do J and Kim M and Kim YW and Kim C and You CY and Min Y and Roh JW and Kwon HJ and Lee S},
  year = {2025},
  journal = {ACS nano},
  doi = {10.1021/acsnano.4c18934},
  url = {https://doi.org/10.1021/acsnano.4c18934}
}

RIS

TY  - JOUR
TI  - High-Resolution Patterning of Breathable Polymer Nanomesh via Double-Side UV Exposure for Fabricating Micropatterned Wearable Devices.
AU  - Bae J
AU  - Song CM
AU  - Kumar PS
AU  - Jang G
AU  - Choi H
AU  - Hwang S
AU  - Shin J
AU  - Kim S
AU  - Do J
AU  - Kim M
AU  - Kim YW
AU  - Kim C
AU  - You CY
AU  - Min Y
AU  - Roh JW
AU  - Kwon HJ
AU  - Lee S
PY  - 2025
JO  - ACS nano
DO  - 10.1021/acsnano.4c18934
UR  - https://doi.org/10.1021/acsnano.4c18934
ER  -

APA

J, B., CM, S., PS, K., G, J., H, C., S, H., J, S., S, K., J, D., M, K., YW, K., C, K., CY, Y., Y, M., JW, R., HJ, K., & S, L. (2025). High-Resolution Patterning of Breathable Polymer Nanomesh via Double-Side UV Exposure for Fabricating Micropatterned Wearable Devices.. ACS nano. https://doi.org/10.1021/acsnano.4c18934

Source records

pubmed · retrieved 2026-09-25T21:03:37.295Z
europe-pmc · retrieved 2026-09-25T21:03:37.313Z