High-Density Sub-10 nm Silicon Nanowires Fabricated via Directed Self-Assembly and Sequential Infiltration Synthesis Synergistic Patterning for Multiple Applications.

Chen G, Xie H, Luo J, Tao S, Bao W, Qu Y, Gao S, Tian S, Xu X, Han S, Cao Z, Chen Y, Xiong S, Wan J

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DOI
10.1021/acsnano.5c16910
Published
2026 Mar 10
Container
ACS nano
Publisher
Not recorded
Open access
unknown

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BibTeX

@article{allodium:10.1021/acsnano.5c16910,
  title = {High-Density Sub-10 nm Silicon Nanowires Fabricated via Directed Self-Assembly and Sequential Infiltration Synthesis Synergistic Patterning for Multiple Applications.},
  author = {Chen G and Xie H and Luo J and Tao S and Bao W and Qu Y and Gao S and Tian S and Xu X and Han S and Cao Z and Chen Y and Xiong S and Wan J},
  year = {2026},
  journal = {ACS nano},
  doi = {10.1021/acsnano.5c16910},
  url = {https://doi.org/10.1021/acsnano.5c16910}
}

RIS

TY  - JOUR
TI  - High-Density Sub-10 nm Silicon Nanowires Fabricated via Directed Self-Assembly and Sequential Infiltration Synthesis Synergistic Patterning for Multiple Applications.
AU  - Chen G
AU  - Xie H
AU  - Luo J
AU  - Tao S
AU  - Bao W
AU  - Qu Y
AU  - Gao S
AU  - Tian S
AU  - Xu X
AU  - Han S
AU  - Cao Z
AU  - Chen Y
AU  - Xiong S
AU  - Wan J
PY  - 2026
JO  - ACS nano
DO  - 10.1021/acsnano.5c16910
UR  - https://doi.org/10.1021/acsnano.5c16910
ER  - 

APA

G, C., H, X., J, L., S, T., W, B., Y, Q., S, G., S, T., X, X., S, H., Z, C., Y, C., S, X., & J, W. (2026). High-Density Sub-10 nm Silicon Nanowires Fabricated via Directed Self-Assembly and Sequential Infiltration Synthesis Synergistic Patterning for Multiple Applications.. ACS nano. https://doi.org/10.1021/acsnano.5c16910

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