Overcoming the Critical Thickness Limit: Interfacial Control of Crystallization Pathways in Atomic-Scale Dielectric Thin Films.

Le Trinh N, Kim W, Lee M, Gu B, Thi SV, Liu J, Nolan M, Kim HM, Kim H, Kim J, Kang Y, Lee HB

Open source

DOI
10.1021/acsnano.6c00649
Published
2026 Jun 23
Container
ACS nano
Publisher
Not recorded
Open access
unknown

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BibTeX

@article{allodium:10.1021/acsnano.6c00649,
  title = {Overcoming the Critical Thickness Limit: Interfacial Control of Crystallization Pathways in Atomic-Scale Dielectric Thin Films.},
  author = {Le Trinh N and Kim W and Lee M and Gu B and Thi SV and Liu J and Nolan M and Kim HM and Kim H and Kim J and Kang Y and Lee HB},
  year = {2026},
  journal = {ACS nano},
  doi = {10.1021/acsnano.6c00649},
  url = {https://doi.org/10.1021/acsnano.6c00649}
}

RIS

TY  - JOUR
TI  - Overcoming the Critical Thickness Limit: Interfacial Control of Crystallization Pathways in Atomic-Scale Dielectric Thin Films.
AU  - Le Trinh N
AU  - Kim W
AU  - Lee M
AU  - Gu B
AU  - Thi SV
AU  - Liu J
AU  - Nolan M
AU  - Kim HM
AU  - Kim H
AU  - Kim J
AU  - Kang Y
AU  - Lee HB
PY  - 2026
JO  - ACS nano
DO  - 10.1021/acsnano.6c00649
UR  - https://doi.org/10.1021/acsnano.6c00649
ER  - 

APA

N, L. T., W, K., M, L., B, G., SV, T., J, L., M, N., HM, K., H, K., J, K., Y, K., & HB, L. (2026). Overcoming the Critical Thickness Limit: Interfacial Control of Crystallization Pathways in Atomic-Scale Dielectric Thin Films.. ACS nano. https://doi.org/10.1021/acsnano.6c00649

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