Residual-Strain-Induced Transport Anisotropy in Chemical Vapor Deposition-Grown Monolayer Molybdenum Disulfide.
- DOI
- 10.1021/acsnano.6c07810
- Published
- 2026 Aug 4
- Container
- ACS nano
- Publisher
- Not recorded
- Open access
- no
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Cite this work
BibTeX
@article{allodium:10.1021/acsnano.6c07810,
title = {Residual-Strain-Induced Transport Anisotropy in Chemical Vapor Deposition-Grown Monolayer Molybdenum Disulfide.},
author = {Chakravarty A and Chen CT and Cabanillas A and Huang Z and Xu G and Liu M and Jaiswal HN and Shahi S and Rozeski C and Jadeja S and Adinehloo D and Qi L and Kuntla PR and Thomay T and Perebeinos V and Yu WJ and Liu X and Sun J and Ma X and Yao F and Li H},
year = {2026},
journal = {ACS nano},
doi = {10.1021/acsnano.6c07810},
url = {https://doi.org/10.1021/acsnano.6c07810}
}RIS
TY - JOUR TI - Residual-Strain-Induced Transport Anisotropy in Chemical Vapor Deposition-Grown Monolayer Molybdenum Disulfide. AU - Chakravarty A AU - Chen CT AU - Cabanillas A AU - Huang Z AU - Xu G AU - Liu M AU - Jaiswal HN AU - Shahi S AU - Rozeski C AU - Jadeja S AU - Adinehloo D AU - Qi L AU - Kuntla PR AU - Thomay T AU - Perebeinos V AU - Yu WJ AU - Liu X AU - Sun J AU - Ma X AU - Yao F AU - Li H PY - 2026 JO - ACS nano DO - 10.1021/acsnano.6c07810 UR - https://doi.org/10.1021/acsnano.6c07810 ER -
APA
A, C., CT, C., A, C., Z, H., G, X., M, L., HN, J., S, S., C, R., S, J., D, A., L, Q., PR, K., T, T., V, P., WJ, Y., X, L., J, S., X, M., F, Y., & H, L. (2026). Residual-Strain-Induced Transport Anisotropy in Chemical Vapor Deposition-Grown Monolayer Molybdenum Disulfide.. ACS nano. https://doi.org/10.1021/acsnano.6c07810
Source records
- pubmed · retrieved 2026-09-25T18:33:07.356Z
- europe-pmc · retrieved 2026-09-25T18:33:07.277Z