Revealing Structure-Driven Performance of Molecular-Atomic Layer Deposited Resists for Extreme Ultraviolet Lithography through <i>In Situ</i> Analysis

Thi Thu Huong Chu, Dan N. Le, Minjong Lee, Dushyant M. Narayan, Nikhil Tiwale, Soham Shirodkar, Doo San Kim, Myung Mo Sung, Oleg Kostko, Chang-Yong Nam, Jiyoung Kim

Open source

DOI: 10.1021/acsnano.6c10856
Published: 2026-09-03
Container: ACS Nano
Publisher: American Chemical Society (ACS)
Open access: unknown

Credibility signals

uncertain Score 64/100 under policy 1.0.0. This is a metadata assessment, not a judgment of the paper's conclusions.

Show all credibility signals

supportingDOI registered: A matching record was returned by Crossref. Source: Crossref; license: CC0 metadata
supportingDOI resolves: A matching record was returned by Crossref. Source: Crossref; license: CC0 metadata
not scoredDirectory of Open Access Journals: No matching DOAJ record was present in this response. No allow-list match; this is not evidence of low credibility. Source: DOAJ; license: CC0
not scoredMEDLINE indexed: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredOpenAlex core source: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredKnown publisher allow-list: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredROR affiliation: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredRetraction Watch retraction: No retraction notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete. Source: Retraction Watch; license: CC BY 4.0
not scoredRetraction Watch expression of concern: No expression of concern notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete. Source: Retraction Watch; license: CC BY 4.0
not scoredRetraction Watch correction: No correction notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete. Source: Retraction Watch; license: CC BY 4.0
not scoredRetraction Watch reinstatement: No reinstatement notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete. Source: Retraction Watch; license: CC BY 4.0
not scoredOpen access status: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredPublication license: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredPublication version: A publication version was supplied but is not scored. Source: Normalized work metadata; license: Caller-provided; provenance license not supplied to scorer
supportingMetadata completeness: All 6 scored descriptive metadata groups are present. Source: Normalized work metadata; license: Caller-provided; provenance license not supplied to scorer

Cite this work

BibTeX

@article{allodium:10.1021/acsnano.6c10856,
  title = {Revealing Structure-Driven
Performance of Molecular-Atomic
Layer Deposited Resists for Extreme Ultraviolet Lithography through
                    <i>In Situ</i>
                    Analysis},
  author = {Thi Thu Huong Chu and Dan N. Le and Minjong Lee and Dushyant M. Narayan and Nikhil Tiwale and Soham Shirodkar and Doo San Kim and Myung Mo Sung and Oleg Kostko and Chang-Yong Nam and Jiyoung Kim},
  year = {2026},
  journal = {ACS Nano},
  doi = {10.1021/acsnano.6c10856},
  url = {https://doi.org/10.1021/acsnano.6c10856}
}

RIS

TY  - JOUR
TI  - Revealing Structure-Driven
Performance of Molecular-Atomic
Layer Deposited Resists for Extreme Ultraviolet Lithography through
                    <i>In Situ</i>
                    Analysis
AU  - Thi Thu Huong Chu
AU  - Dan N. Le
AU  - Minjong Lee
AU  - Dushyant M. Narayan
AU  - Nikhil Tiwale
AU  - Soham Shirodkar
AU  - Doo San Kim
AU  - Myung Mo Sung
AU  - Oleg Kostko
AU  - Chang-Yong Nam
AU  - Jiyoung Kim
PY  - 2026
JO  - ACS Nano
DO  - 10.1021/acsnano.6c10856
UR  - https://doi.org/10.1021/acsnano.6c10856
ER  -

APA

Chu, T. T. H., Le, D. N., Lee, M., Narayan, D. M., Tiwale, N., Shirodkar, S., Kim, D. S., Sung, M. M., Kostko, O., Nam, C., & Kim, J. (2026). Revealing Structure-Driven Performance of Molecular-Atomic Layer Deposited Resists for Extreme Ultraviolet Lithography through <i>In Situ</i> Analysis. ACS Nano. https://doi.org/10.1021/acsnano.6c10856

Source records

crossref · retrieved 2026-11-10T14:14:02.344Z