Preparation and Properties of Organic–Inorganic Hybrid Antireflection Films Made by a Low-Temperature Process Using Hollow Silica Nanoparticles

Ryo Muraguchi, Wataru Futagami, Yuko Hakoshima, Keisuke Awaya, Shintaro Ida

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DOI: 10.1021/acsomega.1c00386
Published: 2021-03-16
Container: ACS Omega
Publisher: American Chemical Society (ACS)
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1021/acsomega.1c00386,
  title = {Preparation and Properties of Organic–Inorganic
Hybrid Antireflection Films Made by a Low-Temperature Process Using
Hollow Silica Nanoparticles},
  author = {Ryo Muraguchi and Wataru Futagami and Yuko Hakoshima and Keisuke Awaya and Shintaro Ida},
  year = {2021},
  journal = {ACS Omega},
  doi = {10.1021/acsomega.1c00386},
  url = {https://doi.org/10.1021/acsomega.1c00386}
}

RIS

TY  - JOUR
TI  - Preparation and Properties of Organic–Inorganic
Hybrid Antireflection Films Made by a Low-Temperature Process Using
Hollow Silica Nanoparticles
AU  - Ryo Muraguchi
AU  - Wataru Futagami
AU  - Yuko Hakoshima
AU  - Keisuke Awaya
AU  - Shintaro Ida
PY  - 2021
JO  - ACS Omega
DO  - 10.1021/acsomega.1c00386
UR  - https://doi.org/10.1021/acsomega.1c00386
ER  -

APA

Muraguchi, R., Futagami, W., Hakoshima, Y., Awaya, K., & Ida, S. (2021). Preparation and Properties of Organic–Inorganic Hybrid Antireflection Films Made by a Low-Temperature Process Using Hollow Silica Nanoparticles. ACS Omega. https://doi.org/10.1021/acsomega.1c00386

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crossref · retrieved 2026-09-26T21:22:00.735Z