Atomic Layer Deposition of AgX (X = Cl, Br, I) Thin Films.

Heidari A, Popov G, Hatanpää T, Weiß A, Chundak M, Mizohata K, Ritala M, Kemell M

DOI: 10.1021/acsomega.5c06913
Published: 2025 Nov 25
Container: ACS omega
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.1021/acsomega.5c06913,
  title = {Atomic Layer Deposition of AgX (X = Cl, Br, I) Thin Films.},
  author = {Heidari A and Popov G and Hatanpää T and Weiß A and Chundak M and Mizohata K and Ritala M and Kemell M},
  year = {2025},
  journal = {ACS omega},
  doi = {10.1021/acsomega.5c06913},
  url = {https://doi.org/10.1021/acsomega.5c06913}
}

RIS

TY  - JOUR
TI  - Atomic Layer Deposition of AgX (X = Cl, Br, I) Thin Films.
AU  - Heidari A
AU  - Popov G
AU  - Hatanpää T
AU  - Weiß A
AU  - Chundak M
AU  - Mizohata K
AU  - Ritala M
AU  - Kemell M
PY  - 2025
JO  - ACS omega
DO  - 10.1021/acsomega.5c06913
UR  - https://doi.org/10.1021/acsomega.5c06913
ER  -

APA

A, H., G, P., T, H., A, W., M, C., K, M., M, R., & M, K. (2025). Atomic Layer Deposition of AgX (X = Cl, Br, I) Thin Films.. ACS omega. https://doi.org/10.1021/acsomega.5c06913

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pubmed · retrieved 2026-09-26T15:41:48.152Z