Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition

Helen Hejin Park, Thomas J. Larrabee, Laura B. Ruppalt, James C. Culbertson, S. M. Prokes

Open source

DOI
10.1021/acsomega.7b00059
Published
2017-04-03
Container
ACS Omega
Publisher
American Chemical Society (ACS)
Open access
unknown

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BibTeX

@article{allodium:10.1021/acsomega.7b00059,
  title = {Tunable Electrical Properties
of Vanadium Oxide by Hydrogen-Plasma-Treated
Atomic Layer Deposition},
  author = {Helen Hejin Park and Thomas J. Larrabee and Laura B. Ruppalt and James C. Culbertson and S. M. Prokes},
  year = {2017},
  journal = {ACS Omega},
  doi = {10.1021/acsomega.7b00059},
  url = {https://doi.org/10.1021/acsomega.7b00059}
}

RIS

TY  - JOUR
TI  - Tunable Electrical Properties
of Vanadium Oxide by Hydrogen-Plasma-Treated
Atomic Layer Deposition
AU  - Helen Hejin Park
AU  - Thomas J. Larrabee
AU  - Laura B. Ruppalt
AU  - James C. Culbertson
AU  - S. M. Prokes
PY  - 2017
JO  - ACS Omega
DO  - 10.1021/acsomega.7b00059
UR  - https://doi.org/10.1021/acsomega.7b00059
ER  - 

APA

Park, H. H., Larrabee, T. J., Ruppalt, L. B., Culbertson, J. C., & Prokes, S. M. (2017). Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition. ACS Omega. https://doi.org/10.1021/acsomega.7b00059

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