Chemorheology of Sol−Gel Silica for the Patterning of High Aspect Ratio Structures by Nanoimprint
- DOI
- 10.1021/cm100285b
- Published
- 2010-04-26
- Container
- Chemistry of Materials
- Publisher
- American Chemical Society (ACS)
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1021/cm100285b,
title = {Chemorheology of Sol−Gel Silica for the Patterning of High Aspect Ratio Structures by Nanoimprint},
author = {Alban Letailleur and Jérémie Teisseire and Nicolas Chemin and Etienne Barthel and Elin Søndergård},
year = {2010},
journal = {Chemistry of Materials},
doi = {10.1021/cm100285b},
url = {https://doi.org/10.1021/cm100285b}
}RIS
TY - JOUR TI - Chemorheology of Sol−Gel Silica for the Patterning of High Aspect Ratio Structures by Nanoimprint AU - Alban Letailleur AU - Jérémie Teisseire AU - Nicolas Chemin AU - Etienne Barthel AU - Elin Søndergård PY - 2010 JO - Chemistry of Materials DO - 10.1021/cm100285b UR - https://doi.org/10.1021/cm100285b ER -
APA
Letailleur, A., Teisseire, J., Chemin, N., Barthel, E., & Søndergård, E. (2010). Chemorheology of Sol−Gel Silica for the Patterning of High Aspect Ratio Structures by Nanoimprint. Chemistry of Materials. https://doi.org/10.1021/cm100285b
Source records
- crossref · retrieved 2026-09-25T18:01:08.503Z