Cycloalkyl Ligand-Engineered Zirconium-Oxo Clusters for Sub-9 nm Electron Beam Lithography with Ultralow Line Edge Roughness.
- DOI
- 10.1021/jacs.6c03438
- Published
- 2026 Jul 1
- Container
- Journal of the American Chemical Society
- Publisher
- Not recorded
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1021/jacs.6c03438,
title = {Cycloalkyl Ligand-Engineered Zirconium-Oxo Clusters for Sub-9 nm Electron Beam Lithography with Ultralow Line Edge Roughness.},
author = {Zhang M and Li W and Lian Z and Chen Z and Wang D and Gong X and Zhao J and Zhu H and Chen P and Peng X},
year = {2026},
journal = {Journal of the American Chemical Society},
doi = {10.1021/jacs.6c03438},
url = {https://doi.org/10.1021/jacs.6c03438}
}RIS
TY - JOUR TI - Cycloalkyl Ligand-Engineered Zirconium-Oxo Clusters for Sub-9 nm Electron Beam Lithography with Ultralow Line Edge Roughness. AU - Zhang M AU - Li W AU - Lian Z AU - Chen Z AU - Wang D AU - Gong X AU - Zhao J AU - Zhu H AU - Chen P AU - Peng X PY - 2026 JO - Journal of the American Chemical Society DO - 10.1021/jacs.6c03438 UR - https://doi.org/10.1021/jacs.6c03438 ER -
APA
M, Z., W, L., Z, L., Z, C., D, W., X, G., J, Z., H, Z., P, C., & X, P. (2026). Cycloalkyl Ligand-Engineered Zirconium-Oxo Clusters for Sub-9 nm Electron Beam Lithography with Ultralow Line Edge Roughness.. Journal of the American Chemical Society. https://doi.org/10.1021/jacs.6c03438
Source records
- pubmed · retrieved 2026-09-25T15:33:53.117Z