A Complementary Approach to Dialkylsilylenes via Thermodynamically Stable Boron-Ate Silylenoids Derived from Chlorosilylboranes.

Takahashi R, Yamaguchi R, Ito H

DOI: 10.1021/jacs.6c05205
Published: 2026 Sep 2
Container: Journal of the American Chemical Society
Publisher: Not recorded
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1021/jacs.6c05205,
  title = {A Complementary Approach to Dialkylsilylenes via Thermodynamically Stable Boron-Ate Silylenoids Derived from Chlorosilylboranes.},
  author = {Takahashi R and Yamaguchi R and Ito H},
  year = {2026},
  journal = {Journal of the American Chemical Society},
  doi = {10.1021/jacs.6c05205},
  url = {https://doi.org/10.1021/jacs.6c05205}
}

RIS

TY  - JOUR
TI  - A Complementary Approach to Dialkylsilylenes via Thermodynamically Stable Boron-Ate Silylenoids Derived from Chlorosilylboranes.
AU  - Takahashi R
AU  - Yamaguchi R
AU  - Ito H
PY  - 2026
JO  - Journal of the American Chemical Society
DO  - 10.1021/jacs.6c05205
UR  - https://doi.org/10.1021/jacs.6c05205
ER  -

APA

R, T., R, Y., & H, I. (2026). A Complementary Approach to Dialkylsilylenes via Thermodynamically Stable Boron-Ate Silylenoids Derived from Chlorosilylboranes.. Journal of the American Chemical Society. https://doi.org/10.1021/jacs.6c05205

Source records

pubmed · retrieved 2026-09-26T13:11:21.633Z