Effect of support and reactant on the yield and structure of carbon growth by chemical vapor deposition.

Yu Z, Chen D, Tøtdal B, Holmen A

DOI: 10.1021/jp0449760
Published: 2005 Apr 7
Container: The journal of physical chemistry. B
Publisher: Not recorded
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1021/jp0449760,
  title = {Effect of support and reactant on the yield and structure of carbon growth by chemical vapor deposition.},
  author = {Yu Z and Chen D and Tøtdal B and Holmen A},
  year = {2005},
  journal = {The journal of physical chemistry. B},
  doi = {10.1021/jp0449760},
  url = {https://doi.org/10.1021/jp0449760}
}

RIS

TY  - JOUR
TI  - Effect of support and reactant on the yield and structure of carbon growth by chemical vapor deposition.
AU  - Yu Z
AU  - Chen D
AU  - Tøtdal B
AU  - Holmen A
PY  - 2005
JO  - The journal of physical chemistry. B
DO  - 10.1021/jp0449760
UR  - https://doi.org/10.1021/jp0449760
ER  -

APA

Z, Y., D, C., B, T., & A, H. (2005). Effect of support and reactant on the yield and structure of carbon growth by chemical vapor deposition.. The journal of physical chemistry. B. https://doi.org/10.1021/jp0449760

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pubmed · retrieved 2026-09-25T03:39:51.137Z