Displacement Talbot lithography for nano-engineering of III-nitride materials
- DOI
- 10.1038/s41378-019-0101-2
- Published
- 2019-12-02
- Container
- Microsystems & Nanoengineering
- Publisher
- Springer Science and Business Media LLC
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1038/s41378-019-0101-2,
title = {Displacement Talbot lithography for nano-engineering of III-nitride materials},
author = {Pierre-Marie Coulon and Benjamin Damilano and Blandine Alloing and Pierre Chausse and Sebastian Walde and Johannes Enslin and Robert Armstrong and Stéphane Vézian and Sylvia Hagedorn and Tim Wernicke and Jean Massies and Jesus Zúñiga‐Pérez and Markus Weyers and Michael Kneissl and Philip A. Shields},
year = {2019},
journal = {Microsystems \& Nanoengineering},
doi = {10.1038/s41378-019-0101-2},
url = {https://doi.org/10.1038/s41378-019-0101-2}
}RIS
TY - JOUR TI - Displacement Talbot lithography for nano-engineering of III-nitride materials AU - Pierre-Marie Coulon AU - Benjamin Damilano AU - Blandine Alloing AU - Pierre Chausse AU - Sebastian Walde AU - Johannes Enslin AU - Robert Armstrong AU - Stéphane Vézian AU - Sylvia Hagedorn AU - Tim Wernicke AU - Jean Massies AU - Jesus Zúñiga‐Pérez AU - Markus Weyers AU - Michael Kneissl AU - Philip A. Shields PY - 2019 JO - Microsystems & Nanoengineering DO - 10.1038/s41378-019-0101-2 UR - https://doi.org/10.1038/s41378-019-0101-2 ER -
APA
Coulon, P., Damilano, B., Alloing, B., Chausse, P., Walde, S., Enslin, J., Armstrong, R., Vézian, S., Hagedorn, S., Wernicke, T., Massies, J., Zúñiga‐Pérez, J., Weyers, M., Kneissl, M., & Shields, P. A. (2019). Displacement Talbot lithography for nano-engineering of III-nitride materials. Microsystems & Nanoengineering. https://doi.org/10.1038/s41378-019-0101-2
Source records
- crossref · retrieved 2026-09-26T02:23:09.830Z