Chemical vapor deposition growth of continuous monolayer antiferromagnetic CrOCl films

Chao Chen, Yulu Liu, Hongyan Lu, Zihao Wang, Bowen Zheng, Qian Guo, Jingkuan Xiao, Ping Wang, Wanting Xu, Yulin Han, Mingxuan Chen, Xiaofan Cai, Jiabei Huang, Yaqing Han, Di Zhang, Renjun Du, Alexander S. Mayorov, Ziying Li, Shuai Zhang, Yi Huang, Tingting Cheng, Zhaolong Chen, Ronghua Liu, Nujiang Tang, Haibo Ni, Di Wu, Libo Gao, Xiaoxiang Xi, Qianghua Wang, Lei Wang, Kostya S. Novoselov, Geliang Yu

Open source

DOI: 10.1038/s41467-025-66142-8
Published: 2025-12-17
Container: Nature Communications
Publisher: Springer Science and Business Media LLC
Open access: unknown

Credibility signals

uncertain Score 64/100 under policy 1.0.0. This is a metadata assessment, not a judgment of the paper's conclusions.

Show all credibility signals

supportingDOI registered: A matching record was returned by Crossref. Source: Crossref; license: CC0 metadata
supportingDOI resolves: A matching record was returned by Crossref. Source: Crossref; license: CC0 metadata
not scoredDirectory of Open Access Journals: No matching DOAJ record was present in this response. No allow-list match; this is not evidence of low credibility. Source: DOAJ; license: CC0
not scoredMEDLINE indexed: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredOpenAlex core source: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredKnown publisher allow-list: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredROR affiliation: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredRetraction Watch retraction: No retraction notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete. Source: Retraction Watch; license: CC BY 4.0
not scoredRetraction Watch expression of concern: No expression of concern notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete. Source: Retraction Watch; license: CC BY 4.0
not scoredRetraction Watch correction: No correction notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete. Source: Retraction Watch; license: CC BY 4.0
not scoredRetraction Watch reinstatement: No reinstatement notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete. Source: Retraction Watch; license: CC BY 4.0
not scoredOpen access status: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredPublication license: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredPublication version: A publication version was supplied but is not scored. Source: Normalized work metadata; license: Caller-provided; provenance license not supplied to scorer
supportingMetadata completeness: All 6 scored descriptive metadata groups are present. Source: Normalized work metadata; license: Caller-provided; provenance license not supplied to scorer

Cite this work

BibTeX

@article{allodium:10.1038/s41467-025-66142-8,
  title = {Chemical vapor deposition growth of continuous monolayer antiferromagnetic CrOCl films},
  author = {Chao Chen and Yulu Liu and Hongyan Lu and Zihao Wang and Bowen Zheng and Qian Guo and Jingkuan Xiao and Ping Wang and Wanting Xu and Yulin Han and Mingxuan Chen and Xiaofan Cai and Jiabei Huang and Yaqing Han and Di Zhang and Renjun Du and Alexander S. Mayorov and Ziying Li and Shuai Zhang and Yi Huang and Tingting Cheng and Zhaolong Chen and Ronghua Liu and Nujiang Tang and Haibo Ni and Di Wu and Libo Gao and Xiaoxiang Xi and Qianghua Wang and Lei Wang and Kostya S. Novoselov and Geliang Yu},
  year = {2025},
  journal = {Nature Communications},
  doi = {10.1038/s41467-025-66142-8},
  url = {https://doi.org/10.1038/s41467-025-66142-8}
}

RIS

TY  - JOUR
TI  - Chemical vapor deposition growth of continuous monolayer antiferromagnetic CrOCl films
AU  - Chao Chen
AU  - Yulu Liu
AU  - Hongyan Lu
AU  - Zihao Wang
AU  - Bowen Zheng
AU  - Qian Guo
AU  - Jingkuan Xiao
AU  - Ping Wang
AU  - Wanting Xu
AU  - Yulin Han
AU  - Mingxuan Chen
AU  - Xiaofan Cai
AU  - Jiabei Huang
AU  - Yaqing Han
AU  - Di Zhang
AU  - Renjun Du
AU  - Alexander S. Mayorov
AU  - Ziying Li
AU  - Shuai Zhang
AU  - Yi Huang
AU  - Tingting Cheng
AU  - Zhaolong Chen
AU  - Ronghua Liu
AU  - Nujiang Tang
AU  - Haibo Ni
AU  - Di Wu
AU  - Libo Gao
AU  - Xiaoxiang Xi
AU  - Qianghua Wang
AU  - Lei Wang
AU  - Kostya S. Novoselov
AU  - Geliang Yu
PY  - 2025
JO  - Nature Communications
DO  - 10.1038/s41467-025-66142-8
UR  - https://doi.org/10.1038/s41467-025-66142-8
ER  -

APA

Chen, C., Liu, Y., Lu, H., Wang, Z., Zheng, B., Guo, Q., Xiao, J., Wang, P., Xu, W., Han, Y., Chen, M., Cai, X., Huang, J., Han, Y., Zhang, D., Du, R., Mayorov, A. S., Li, Z., Zhang, S., Huang, Y., Cheng, T., Chen, Z., Liu, R., Tang, N., Ni, H., Wu, D., Gao, L., Xi, X., Wang, Q., Wang, L., Novoselov, K. S., & Yu, G. (2025). Chemical vapor deposition growth of continuous monolayer antiferromagnetic CrOCl films. Nature Communications. https://doi.org/10.1038/s41467-025-66142-8

Source records

crossref · retrieved 2026-09-26T16:47:15.260Z