All-2D vertical metal-semiconductor field-effect transistor with sub-10 nm channel and contact lengths

Yi Zhang, Xionghui Jia, Jiamin Chen, Minglai Li, Yanping Li, Lun Dai

Open source

DOI
10.1038/s41467-026-74555-2
Published
2026-06-19
Container
Nature Communications
Publisher
Springer Science and Business Media LLC
Open access
unknown

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BibTeX

@article{allodium:10.1038/s41467-026-74555-2,
  title = {All-2D vertical metal-semiconductor field-effect transistor with sub-10 nm channel and contact lengths},
  author = {Yi Zhang and Xionghui Jia and Jiamin Chen and Minglai Li and Yanping Li and Lun Dai},
  year = {2026},
  journal = {Nature Communications},
  doi = {10.1038/s41467-026-74555-2},
  url = {https://doi.org/10.1038/s41467-026-74555-2}
}

RIS

TY  - JOUR
TI  - All-2D vertical metal-semiconductor field-effect transistor with sub-10 nm channel and contact lengths
AU  - Yi Zhang
AU  - Xionghui Jia
AU  - Jiamin Chen
AU  - Minglai Li
AU  - Yanping Li
AU  - Lun Dai
PY  - 2026
JO  - Nature Communications
DO  - 10.1038/s41467-026-74555-2
UR  - https://doi.org/10.1038/s41467-026-74555-2
ER  - 

APA

Zhang, Y., Jia, X., Chen, J., Li, M., Li, Y., & Dai, L. (2026). All-2D vertical metal-semiconductor field-effect transistor with sub-10 nm channel and contact lengths. Nature Communications. https://doi.org/10.1038/s41467-026-74555-2

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