Krypton-sputtered tantalum films for scalable high-performance quantum devices.

Olszewski MW, Kong L, Reinhardt S, Tong D, Du X, Di Gianluca G, Lu H, Roy S, Zhang L, Biedron AB, Muller DA, Fatemi V

Open source

DOI
10.1038/s41563-026-02718-z
Published
2026 Aug 18
Container
Nature materials
Publisher
Not recorded
Open access
unknown

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BibTeX

@article{allodium:10.1038/s41563-026-02718-z,
  title = {Krypton-sputtered tantalum films for scalable high-performance quantum devices.},
  author = {Olszewski MW and Kong L and Reinhardt S and Tong D and Du X and Di Gianluca G and Lu H and Roy S and Zhang L and Biedron AB and Muller DA and Fatemi V},
  year = {2026},
  journal = {Nature materials},
  doi = {10.1038/s41563-026-02718-z},
  url = {https://doi.org/10.1038/s41563-026-02718-z}
}

RIS

TY  - JOUR
TI  - Krypton-sputtered tantalum films for scalable high-performance quantum devices.
AU  - Olszewski MW
AU  - Kong L
AU  - Reinhardt S
AU  - Tong D
AU  - Du X
AU  - Di Gianluca G
AU  - Lu H
AU  - Roy S
AU  - Zhang L
AU  - Biedron AB
AU  - Muller DA
AU  - Fatemi V
PY  - 2026
JO  - Nature materials
DO  - 10.1038/s41563-026-02718-z
UR  - https://doi.org/10.1038/s41563-026-02718-z
ER  - 

APA

MW, O., L, K., S, R., D, T., X, D., G, D. G., H, L., S, R., L, Z., AB, B., DA, M., & V, F. (2026). Krypton-sputtered tantalum films for scalable high-performance quantum devices.. Nature materials. https://doi.org/10.1038/s41563-026-02718-z

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