Scalable transfer for industrial 2D-CMOS manufacturing.

Biswas C, Ghosh S, Brems S, Liechti KM, Akinwande D

DOI: 10.1038/s41565-026-02217-x
Published: 2026 Sep
Container: Nature nanotechnology
Publisher: Not recorded
Open access: no

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Cite this work

BibTeX

@article{allodium:10.1038/s41565-026-02217-x,
  title = {Scalable transfer for industrial 2D-CMOS manufacturing.},
  author = {Biswas C and Ghosh S and Brems S and Liechti KM and Akinwande D},
  year = {2026},
  journal = {Nature nanotechnology},
  doi = {10.1038/s41565-026-02217-x},
  url = {https://doi.org/10.1038/s41565-026-02217-x}
}

RIS

TY  - JOUR
TI  - Scalable transfer for industrial 2D-CMOS manufacturing.
AU  - Biswas C
AU  - Ghosh S
AU  - Brems S
AU  - Liechti KM
AU  - Akinwande D
PY  - 2026
JO  - Nature nanotechnology
DO  - 10.1038/s41565-026-02217-x
UR  - https://doi.org/10.1038/s41565-026-02217-x
ER  -

APA

C, B., S, G., S, B., KM, L., & D, A. (2026). Scalable transfer for industrial 2D-CMOS manufacturing.. Nature nanotechnology. https://doi.org/10.1038/s41565-026-02217-x

Source records

pubmed · retrieved 2026-09-26T03:05:39.125Z
europe-pmc · retrieved 2026-09-26T03:05:39.125Z