Monolithic 3D integration of atomic-layer-deposited oxide semiconductors on 200-mm silicon wafers.

Niu C, Long L, Zheng L, Du S, Lin JY, Nam K, Lin Z, Liu C, Lu J, Wang H, Li H, Ye PD

DOI: 10.1038/s41565-026-02276-0
Published: 2026 Sep 15
Container: Nature nanotechnology
Publisher: Not recorded
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1038/s41565-026-02276-0,
  title = {Monolithic 3D integration of atomic-layer-deposited oxide semiconductors on 200-mm silicon wafers.},
  author = {Niu C and Long L and Zheng L and Du S and Lin JY and Nam K and Lin Z and Liu C and Lu J and Wang H and Li H and Ye PD},
  year = {2026},
  journal = {Nature nanotechnology},
  doi = {10.1038/s41565-026-02276-0},
  url = {https://doi.org/10.1038/s41565-026-02276-0}
}

RIS

TY  - JOUR
TI  - Monolithic 3D integration of atomic-layer-deposited oxide semiconductors on 200-mm silicon wafers.
AU  - Niu C
AU  - Long L
AU  - Zheng L
AU  - Du S
AU  - Lin JY
AU  - Nam K
AU  - Lin Z
AU  - Liu C
AU  - Lu J
AU  - Wang H
AU  - Li H
AU  - Ye PD
PY  - 2026
JO  - Nature nanotechnology
DO  - 10.1038/s41565-026-02276-0
UR  - https://doi.org/10.1038/s41565-026-02276-0
ER  -

APA

C, N., L, L., L, Z., S, D., JY, L., K, N., Z, L., C, L., J, L., H, W., H, L., & PD, Y. (2026). Monolithic 3D integration of atomic-layer-deposited oxide semiconductors on 200-mm silicon wafers.. Nature nanotechnology. https://doi.org/10.1038/s41565-026-02276-0

Source records

pubmed · retrieved 2026-09-25T23:53:22.946Z