Electroluminescent photoresists extending lithographic scaling to OLEDs

Shao-Wei Lo, Sunil B. Shivarudraiah, Zhan-Hong Lin, Patrick Helbling, Lifei Song, Jiachen Wang, Miguel Nouman, Fuze Jiang, Gerrit Stemmler, Donato Maria Carretta, Mei-Nung Chen, Jiayi Zhu, Sudhir Kumar, Hua Wang, Andrew J. Christofferson, Yinyin Bao, Chih-Jen Shih

Open source

DOI
10.1038/s41586-026-11042-0
Published
2026-09-16
Container
Nature
Publisher
Springer Science and Business Media LLC
Open access
unknown

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BibTeX

@article{allodium:10.1038/s41586-026-11042-0,
  title = {Electroluminescent photoresists extending lithographic scaling to OLEDs},
  author = {Shao-Wei Lo and Sunil B. Shivarudraiah and Zhan-Hong Lin and Patrick Helbling and Lifei Song and Jiachen Wang and Miguel Nouman and Fuze Jiang and Gerrit Stemmler and Donato Maria Carretta and Mei-Nung Chen and Jiayi Zhu and Sudhir Kumar and Hua Wang and Andrew J. Christofferson and Yinyin Bao and Chih-Jen Shih},
  year = {2026},
  journal = {Nature},
  doi = {10.1038/s41586-026-11042-0},
  url = {https://doi.org/10.1038/s41586-026-11042-0}
}

RIS

TY  - JOUR
TI  - Electroluminescent photoresists extending lithographic scaling to OLEDs
AU  - Shao-Wei Lo
AU  - Sunil B. Shivarudraiah
AU  - Zhan-Hong Lin
AU  - Patrick Helbling
AU  - Lifei Song
AU  - Jiachen Wang
AU  - Miguel Nouman
AU  - Fuze Jiang
AU  - Gerrit Stemmler
AU  - Donato Maria Carretta
AU  - Mei-Nung Chen
AU  - Jiayi Zhu
AU  - Sudhir Kumar
AU  - Hua Wang
AU  - Andrew J. Christofferson
AU  - Yinyin Bao
AU  - Chih-Jen Shih
PY  - 2026
JO  - Nature
DO  - 10.1038/s41586-026-11042-0
UR  - https://doi.org/10.1038/s41586-026-11042-0
ER  - 

APA

Lo, S., Shivarudraiah, S. B., Lin, Z., Helbling, P., Song, L., Wang, J., Nouman, M., Jiang, F., Stemmler, G., Carretta, D. M., Chen, M., Zhu, J., Kumar, S., Wang, H., Christofferson, A. J., Bao, Y., & Shih, C. (2026). Electroluminescent photoresists extending lithographic scaling to OLEDs. Nature. https://doi.org/10.1038/s41586-026-11042-0

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