Author Correction: Wafer-scale epitaxy growth of high-mobility p-type boron carbon nitride.

Tseng CC, Huang CH, Kao JC, Fu JH, Li A, Ishikawa R, Cho SR, Lei C, Qi K, Deng CZ, Yang PY, Pan CT, Chen WC, Wu MC, Chen FZ, Lin YW, Lo YC, Ho YL, Nagashio K, Chou YC, Shibata N, Pao CW, Tung V

Open source

DOI
10.1038/s41586-026-11267-z
Published
2026 Oct
Container
Nature
Publisher
Not recorded
Open access
no

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BibTeX

@article{allodium:10.1038/s41586-026-11267-z,
  title = {Author Correction: Wafer-scale epitaxy growth of high-mobility p-type boron carbon nitride.},
  author = {Tseng CC and Huang CH and Kao JC and Fu JH and Li A and Ishikawa R and Cho SR and Lei C and Qi K and Deng CZ and Yang PY and Pan CT and Chen WC and Wu MC and Chen FZ and Lin YW and Lo YC and Ho YL and Nagashio K and Chou YC and Shibata N and Pao CW and Tung V},
  year = {2026},
  journal = {Nature},
  doi = {10.1038/s41586-026-11267-z},
  url = {https://doi.org/10.1038/s41586-026-11267-z}
}

RIS

TY  - JOUR
TI  - Author Correction: Wafer-scale epitaxy growth of high-mobility p-type boron carbon nitride.
AU  - Tseng CC
AU  - Huang CH
AU  - Kao JC
AU  - Fu JH
AU  - Li A
AU  - Ishikawa R
AU  - Cho SR
AU  - Lei C
AU  - Qi K
AU  - Deng CZ
AU  - Yang PY
AU  - Pan CT
AU  - Chen WC
AU  - Wu MC
AU  - Chen FZ
AU  - Lin YW
AU  - Lo YC
AU  - Ho YL
AU  - Nagashio K
AU  - Chou YC
AU  - Shibata N
AU  - Pao CW
AU  - Tung V
PY  - 2026
JO  - Nature
DO  - 10.1038/s41586-026-11267-z
UR  - https://doi.org/10.1038/s41586-026-11267-z
ER  - 

APA

CC, T., CH, H., JC, K., JH, F., A, L., R, I., SR, C., C, L., K, Q., CZ, D., PY, Y., CT, P., WC, C., MC, W., FZ, C., YW, L., YC, L., YL, H., K, N., YC, C., N, S., CW, P., & V, T. (2026). Author Correction: Wafer-scale epitaxy growth of high-mobility p-type boron carbon nitride.. Nature. https://doi.org/10.1038/s41586-026-11267-z

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