Silicon Nitride Deposition for Flexible Organic Electronic Devices by VHF (162 MHz)-PECVD Using a Multi-Tile Push-Pull Plasma Source.
- DOI
- 10.1038/s41598-017-14122-4
- Published
- 2017 Oct 19
- Container
- Scientific reports
- Publisher
- Not recorded
- Open access
- yes
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Cite this work
BibTeX
@article{allodium:10.1038/s41598-017-14122-4,
title = {Silicon Nitride Deposition for Flexible Organic Electronic Devices by VHF (162 MHz)-PECVD Using a Multi-Tile Push-Pull Plasma Source.},
author = {Kim KS and Kim KH and Ji YJ and Park JW and Shin JH and Ellingboe AR and Yeom GY},
year = {2017},
journal = {Scientific reports},
doi = {10.1038/s41598-017-14122-4},
url = {https://doi.org/10.1038/s41598-017-14122-4}
}RIS
TY - JOUR TI - Silicon Nitride Deposition for Flexible Organic Electronic Devices by VHF (162 MHz)-PECVD Using a Multi-Tile Push-Pull Plasma Source. AU - Kim KS AU - Kim KH AU - Ji YJ AU - Park JW AU - Shin JH AU - Ellingboe AR AU - Yeom GY PY - 2017 JO - Scientific reports DO - 10.1038/s41598-017-14122-4 UR - https://doi.org/10.1038/s41598-017-14122-4 ER -
APA
KS, K., KH, K., YJ, J., JW, P., JH, S., AR, E., & GY, Y. (2017). Silicon Nitride Deposition for Flexible Organic Electronic Devices by VHF (162 MHz)-PECVD Using a Multi-Tile Push-Pull Plasma Source.. Scientific reports. https://doi.org/10.1038/s41598-017-14122-4
Source records
- pubmed · retrieved 2026-09-26T04:44:08.873Z