Formation of nanoscale vapour films governing thermal resistance in amorphous ice.
- DOI
- 10.1038/s42004-026-02177-2
- Published
- 2026 Sep 1
- Container
- Communications chemistry
- Publisher
- Not recorded
- Open access
- yes
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Cite this work
BibTeX
@article{allodium:10.1038/s42004-026-02177-2,
title = {Formation of nanoscale vapour films governing thermal resistance in amorphous ice.},
author = {Liu Y and Eklund T and Karina A and Hövelmann S and Bauer RPC and You S and Goy C and Striker NN and Gierke A and Hess K and Schlage K and Bocklage L and Ardana Lamas F and Wang H and Jiang Y and Uemara Y and Milne C and Kim KH and Murphy B and Lehmkühler F and Zalden P and Amann-Winkel K},
year = {2026},
journal = {Communications chemistry},
doi = {10.1038/s42004-026-02177-2},
url = {https://doi.org/10.1038/s42004-026-02177-2}
}RIS
TY - JOUR TI - Formation of nanoscale vapour films governing thermal resistance in amorphous ice. AU - Liu Y AU - Eklund T AU - Karina A AU - Hövelmann S AU - Bauer RPC AU - You S AU - Goy C AU - Striker NN AU - Gierke A AU - Hess K AU - Schlage K AU - Bocklage L AU - Ardana Lamas F AU - Wang H AU - Jiang Y AU - Uemara Y AU - Milne C AU - Kim KH AU - Murphy B AU - Lehmkühler F AU - Zalden P AU - Amann-Winkel K PY - 2026 JO - Communications chemistry DO - 10.1038/s42004-026-02177-2 UR - https://doi.org/10.1038/s42004-026-02177-2 ER -
APA
Y, L., T, E., A, K., S, H., RPC, B., S, Y., C, G., NN, S., A, G., K, H., K, S., L, B., F, A. L., H, W., Y, J., Y, U., C, M., KH, K., B, M., F, L., P, Z., & K, A. (2026). Formation of nanoscale vapour films governing thermal resistance in amorphous ice.. Communications chemistry. https://doi.org/10.1038/s42004-026-02177-2
Source records
- pubmed · retrieved 2026-09-25T14:24:06.091Z