Integrating Epitaxial-Like Pb(Zr,Ti)O3 Thin-Film into Silicon for Next-Generation Ferroelectric Field-Effect Transistor

Jae Hyo Park, Hyung Yoon Kim, Gil Su Jang, Ki Hwan Seok, Hee Jae Chae, Sol Kyu Lee, Zohreh Kiaee, Seung Ki Joo

Open source

DOI
10.1038/srep23189
Published
2016-03-23
Container
Scientific Reports
Publisher
Springer Science and Business Media LLC
Open access
unknown

Credibility signals

serious concern Score 29/100 under policy 1.0.0. This is a metadata assessment, not a judgment of the paper's conclusions.

Show all credibility signals

Cite this work

BibTeX

@article{allodium:10.1038/srep23189,
  title = {Integrating Epitaxial-Like Pb(Zr,Ti)O3 Thin-Film into Silicon for Next-Generation Ferroelectric Field-Effect Transistor},
  author = {Jae Hyo Park and Hyung Yoon Kim and Gil Su Jang and Ki Hwan Seok and Hee Jae Chae and Sol Kyu Lee and Zohreh Kiaee and Seung Ki Joo},
  year = {2016},
  journal = {Scientific Reports},
  doi = {10.1038/srep23189},
  url = {https://doi.org/10.1038/srep23189}
}

RIS

TY  - JOUR
TI  - Integrating Epitaxial-Like Pb(Zr,Ti)O3 Thin-Film into Silicon for Next-Generation Ferroelectric Field-Effect Transistor
AU  - Jae Hyo Park
AU  - Hyung Yoon Kim
AU  - Gil Su Jang
AU  - Ki Hwan Seok
AU  - Hee Jae Chae
AU  - Sol Kyu Lee
AU  - Zohreh Kiaee
AU  - Seung Ki Joo
PY  - 2016
JO  - Scientific Reports
DO  - 10.1038/srep23189
UR  - https://doi.org/10.1038/srep23189
ER  - 

APA

Park, J. H., Kim, H. Y., Jang, G. S., Seok, K. H., Chae, H. J., Lee, S. K., Kiaee, Z., & Joo, S. K. (2016). Integrating Epitaxial-Like Pb(Zr,Ti)O3 Thin-Film into Silicon for Next-Generation Ferroelectric Field-Effect Transistor. Scientific Reports. https://doi.org/10.1038/srep23189

Source records