Probing the molecular structures of plasma-damaged and surface-repaired low-k dielectrics.

Zhang X, Myers JN, Lin Q, Bielefeld JD, Chen Z

DOI: 10.1039/c5cp03649f
Published: 2015 Oct 21
Container: Physical chemistry chemical physics : PCCP
Publisher: Not recorded
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1039/c5cp03649f,
  title = {Probing the molecular structures of plasma-damaged and surface-repaired low-k dielectrics.},
  author = {Zhang X and Myers JN and Lin Q and Bielefeld JD and Chen Z},
  year = {2015},
  journal = {Physical chemistry chemical physics : PCCP},
  doi = {10.1039/c5cp03649f},
  url = {https://doi.org/10.1039/c5cp03649f}
}

RIS

TY  - JOUR
TI  - Probing the molecular structures of plasma-damaged and surface-repaired low-k dielectrics.
AU  - Zhang X
AU  - Myers JN
AU  - Lin Q
AU  - Bielefeld JD
AU  - Chen Z
PY  - 2015
JO  - Physical chemistry chemical physics : PCCP
DO  - 10.1039/c5cp03649f
UR  - https://doi.org/10.1039/c5cp03649f
ER  -

APA

X, Z., JN, M., Q, L., JD, B., & Z, C. (2015). Probing the molecular structures of plasma-damaged and surface-repaired low-k dielectrics.. Physical chemistry chemical physics : PCCP. https://doi.org/10.1039/c5cp03649f

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pubmed · retrieved 2026-09-26T09:10:34.299Z