Effects of thermal annealing on analog resistive switching behavior in bilayer HfO(2)/ZnO synaptic devices: the role of ZnO grain boundaries.

An YJ, Yan H, Yeom CM, Jeong JK, Eadi SB, Lee HD, Kwon HM

Open source

DOI
10.1039/d3nr04917e
Published
2024 Feb 29
Container
Nanoscale
Publisher
Not recorded
Open access
no

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BibTeX

@article{allodium:10.1039/d3nr04917e,
  title = {Effects of thermal annealing on analog resistive switching behavior in bilayer HfO(2)/ZnO synaptic devices: the role of ZnO grain boundaries.},
  author = {An YJ and Yan H and Yeom CM and Jeong JK and Eadi SB and Lee HD and Kwon HM},
  year = {2024},
  journal = {Nanoscale},
  doi = {10.1039/d3nr04917e},
  url = {https://doi.org/10.1039/d3nr04917e}
}

RIS

TY  - JOUR
TI  - Effects of thermal annealing on analog resistive switching behavior in bilayer HfO(2)/ZnO synaptic devices: the role of ZnO grain boundaries.
AU  - An YJ
AU  - Yan H
AU  - Yeom CM
AU  - Jeong JK
AU  - Eadi SB
AU  - Lee HD
AU  - Kwon HM
PY  - 2024
JO  - Nanoscale
DO  - 10.1039/d3nr04917e
UR  - https://doi.org/10.1039/d3nr04917e
ER  - 

APA

YJ, A., H, Y., CM, Y., JK, J., SB, E., HD, L., & HM, K. (2024). Effects of thermal annealing on analog resistive switching behavior in bilayer HfO(2)/ZnO synaptic devices: the role of ZnO grain boundaries.. Nanoscale. https://doi.org/10.1039/d3nr04917e

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