Band alignment in CdS-α-Te van der Waals heterostructures for photocatalytic applications: influence of biaxial strain and electric field.
- DOI
- 10.1039/d4cp03368j
- Published
- 2024 Dec 4
- Container
- Physical chemistry chemical physics : PCCP
- Publisher
- Not recorded
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1039/d4cp03368j,
title = {Band alignment in CdS-α-Te van der Waals heterostructures for photocatalytic applications: influence of biaxial strain and electric field.},
author = {Tejaswini G and Sudheer AE and Vallinayagam M and Posselt M and Zschornak M and Maniprakash S and Murali D},
year = {2024},
journal = {Physical chemistry chemical physics : PCCP},
doi = {10.1039/d4cp03368j},
url = {https://doi.org/10.1039/d4cp03368j}
}RIS
TY - JOUR TI - Band alignment in CdS-α-Te van der Waals heterostructures for photocatalytic applications: influence of biaxial strain and electric field. AU - Tejaswini G AU - Sudheer AE AU - Vallinayagam M AU - Posselt M AU - Zschornak M AU - Maniprakash S AU - Murali D PY - 2024 JO - Physical chemistry chemical physics : PCCP DO - 10.1039/d4cp03368j UR - https://doi.org/10.1039/d4cp03368j ER -
APA
G, T., AE, S., M, V., M, P., M, Z., S, M., & D, M. (2024). Band alignment in CdS-α-Te van der Waals heterostructures for photocatalytic applications: influence of biaxial strain and electric field.. Physical chemistry chemical physics : PCCP. https://doi.org/10.1039/d4cp03368j
Source records
- pubmed · retrieved 2026-09-26T03:13:25.973Z