Band alignment in CdS-α-Te van der Waals heterostructures for photocatalytic applications: influence of biaxial strain and electric field.

Tejaswini G, Sudheer AE, Vallinayagam M, Posselt M, Zschornak M, Maniprakash S, Murali D

Open source

DOI
10.1039/d4cp03368j
Published
2024 Dec 4
Container
Physical chemistry chemical physics : PCCP
Publisher
Not recorded
Open access
unknown

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BibTeX

@article{allodium:10.1039/d4cp03368j,
  title = {Band alignment in CdS-α-Te van der Waals heterostructures for photocatalytic applications: influence of biaxial strain and electric field.},
  author = {Tejaswini G and Sudheer AE and Vallinayagam M and Posselt M and Zschornak M and Maniprakash S and Murali D},
  year = {2024},
  journal = {Physical chemistry chemical physics : PCCP},
  doi = {10.1039/d4cp03368j},
  url = {https://doi.org/10.1039/d4cp03368j}
}

RIS

TY  - JOUR
TI  - Band alignment in CdS-α-Te van der Waals heterostructures for photocatalytic applications: influence of biaxial strain and electric field.
AU  - Tejaswini G
AU  - Sudheer AE
AU  - Vallinayagam M
AU  - Posselt M
AU  - Zschornak M
AU  - Maniprakash S
AU  - Murali D
PY  - 2024
JO  - Physical chemistry chemical physics : PCCP
DO  - 10.1039/d4cp03368j
UR  - https://doi.org/10.1039/d4cp03368j
ER  - 

APA

G, T., AE, S., M, V., M, P., M, Z., S, M., & D, M. (2024). Band alignment in CdS-α-Te van der Waals heterostructures for photocatalytic applications: influence of biaxial strain and electric field.. Physical chemistry chemical physics : PCCP. https://doi.org/10.1039/d4cp03368j

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