Recent advances in CeO <sub>2</sub> based abrasives for chemical mechanical polishing

Yongxin Wang, Yunhui Shi, Jiabao Cheng, Yao Xu, Yizhan Wang, Jiawei Qiu

Open source

DOI: 10.1039/d5cp00778j
Published: 2025
Container: Physical Chemistry Chemical Physics
Publisher: Royal Society of Chemistry (RSC)
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1039/d5cp00778j,
  title = {Recent advances in CeO
                    <sub>2</sub>
                    based abrasives for chemical mechanical polishing},
  author = {Yongxin Wang and Yunhui Shi and Jiabao Cheng and Yao Xu and Yizhan Wang and Jiawei Qiu},
  year = {2025},
  journal = {Physical Chemistry Chemical Physics},
  doi = {10.1039/d5cp00778j},
  url = {https://doi.org/10.1039/d5cp00778j}
}

RIS

TY  - JOUR
TI  - Recent advances in CeO
                    <sub>2</sub>
                    based abrasives for chemical mechanical polishing
AU  - Yongxin Wang
AU  - Yunhui Shi
AU  - Jiabao Cheng
AU  - Yao Xu
AU  - Yizhan Wang
AU  - Jiawei Qiu
PY  - 2025
JO  - Physical Chemistry Chemical Physics
DO  - 10.1039/d5cp00778j
UR  - https://doi.org/10.1039/d5cp00778j
ER  -

APA

Wang, Y., Shi, Y., Cheng, J., Xu, Y., Wang, Y., & Qiu, J. (2025). Recent advances in CeO <sub>2</sub> based abrasives for chemical mechanical polishing. Physical Chemistry Chemical Physics. https://doi.org/10.1039/d5cp00778j

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crossref · retrieved 2026-09-25T08:05:25.019Z