5 nm Gate length field-effect transistors based on monolayer α-In(2)X(3) (X = S, Se, Te).

Zhong YY, Dai JQ, Yuan J, Deng DW, Zhao MW

Open source

DOI
10.1039/d5cp02433a
Published
2025 Oct 22
Container
Physical chemistry chemical physics : PCCP
Publisher
Not recorded
Open access
unknown

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BibTeX

@article{allodium:10.1039/d5cp02433a,
  title = {5 nm Gate length field-effect transistors based on monolayer α-In(2)X(3) (X = S, Se, Te).},
  author = {Zhong YY and Dai JQ and Yuan J and Deng DW and Zhao MW},
  year = {2025},
  journal = {Physical chemistry chemical physics : PCCP},
  doi = {10.1039/d5cp02433a},
  url = {https://doi.org/10.1039/d5cp02433a}
}

RIS

TY  - JOUR
TI  - 5 nm Gate length field-effect transistors based on monolayer α-In(2)X(3) (X = S, Se, Te).
AU  - Zhong YY
AU  - Dai JQ
AU  - Yuan J
AU  - Deng DW
AU  - Zhao MW
PY  - 2025
JO  - Physical chemistry chemical physics : PCCP
DO  - 10.1039/d5cp02433a
UR  - https://doi.org/10.1039/d5cp02433a
ER  - 

APA

YY, Z., JQ, D., J, Y., DW, D., & MW, Z. (2025). 5 nm Gate length field-effect transistors based on monolayer α-In(2)X(3) (X = S, Se, Te).. Physical chemistry chemical physics : PCCP. https://doi.org/10.1039/d5cp02433a

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