Comparative study on the influence mechanism of He/Ar/N <sub>2</sub> plasma treatments on the high tensile stress of a multilayer silicon nitride film

Jianping Ning, Zhen Tang, Yue Sun, Chunjie Niu, Jichi Yang, Dayu Zhou

Open source

DOI: 10.1039/d5ra02111a
Published: 2025
Container: RSC Advances
Publisher: Royal Society of Chemistry (RSC)
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1039/d5ra02111a,
  title = {Comparative study on the influence mechanism of He/Ar/N
                    <sub>2</sub>
                    plasma treatments on the high tensile stress of a multilayer silicon nitride film},
  author = {Jianping Ning and Zhen Tang and Yue Sun and Chunjie Niu and Jichi Yang and Dayu Zhou},
  year = {2025},
  journal = {RSC Advances},
  doi = {10.1039/d5ra02111a},
  url = {https://doi.org/10.1039/d5ra02111a}
}

RIS

TY  - JOUR
TI  - Comparative study on the influence mechanism of He/Ar/N
                    <sub>2</sub>
                    plasma treatments on the high tensile stress of a multilayer silicon nitride film
AU  - Jianping Ning
AU  - Zhen Tang
AU  - Yue Sun
AU  - Chunjie Niu
AU  - Jichi Yang
AU  - Dayu Zhou
PY  - 2025
JO  - RSC Advances
DO  - 10.1039/d5ra02111a
UR  - https://doi.org/10.1039/d5ra02111a
ER  -

APA

Ning, J., Tang, Z., Sun, Y., Niu, C., Yang, J., & Zhou, D. (2025). Comparative study on the influence mechanism of He/Ar/N <sub>2</sub> plasma treatments on the high tensile stress of a multilayer silicon nitride film. RSC Advances. https://doi.org/10.1039/d5ra02111a

Source records

crossref · retrieved 2026-09-25T03:43:39.686Z