Thickness-matched FT-IR benchmarking reveals spectral bias in AFM-IR measurements of supported silica films.

Nagasaka T, Inoue K, Suzuki A, Tanahashi Y, Seki H

DOI: 10.1039/d6an01014h
Published: 2026 Nov 9
Container: The Analyst
Publisher: Not recorded
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1039/d6an01014h,
  title = {Thickness-matched FT-IR benchmarking reveals spectral bias in AFM-IR measurements of supported silica films.},
  author = {Nagasaka T and Inoue K and Suzuki A and Tanahashi Y and Seki H},
  year = {2026},
  journal = {The Analyst},
  doi = {10.1039/d6an01014h},
  url = {https://doi.org/10.1039/d6an01014h}
}

RIS

TY  - JOUR
TI  - Thickness-matched FT-IR benchmarking reveals spectral bias in AFM-IR measurements of supported silica films.
AU  - Nagasaka T
AU  - Inoue K
AU  - Suzuki A
AU  - Tanahashi Y
AU  - Seki H
PY  - 2026
JO  - The Analyst
DO  - 10.1039/d6an01014h
UR  - https://doi.org/10.1039/d6an01014h
ER  -

APA

T, N., K, I., A, S., Y, T., & H, S. (2026). Thickness-matched FT-IR benchmarking reveals spectral bias in AFM-IR measurements of supported silica films.. The Analyst. https://doi.org/10.1039/d6an01014h

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pubmed · retrieved 2026-11-10T08:11:13.392Z