Controlling the plasma etch rate of poly(4-vinylpyridine) using supramolecular complexation.

Chittick C, Abtahi S, Hendeniya N, Mondal S, White A, Chang B

DOI: 10.1039/d6cc04440a
Published: 2026 Sep 17
Container: Chemical communications (Cambridge, England)
Publisher: Not recorded
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1039/d6cc04440a,
  title = {Controlling the plasma etch rate of poly(4-vinylpyridine) using supramolecular complexation.},
  author = {Chittick C and Abtahi S and Hendeniya N and Mondal S and White A and Chang B},
  year = {2026},
  journal = {Chemical communications (Cambridge, England)},
  doi = {10.1039/d6cc04440a},
  url = {https://doi.org/10.1039/d6cc04440a}
}

RIS

TY  - JOUR
TI  - Controlling the plasma etch rate of poly(4-vinylpyridine) using supramolecular complexation.
AU  - Chittick C
AU  - Abtahi S
AU  - Hendeniya N
AU  - Mondal S
AU  - White A
AU  - Chang B
PY  - 2026
JO  - Chemical communications (Cambridge, England)
DO  - 10.1039/d6cc04440a
UR  - https://doi.org/10.1039/d6cc04440a
ER  -

APA

C, C., S, A., N, H., S, M., A, W., & B, C. (2026). Controlling the plasma etch rate of poly(4-vinylpyridine) using supramolecular complexation.. Chemical communications (Cambridge, England). https://doi.org/10.1039/d6cc04440a

Source records

pubmed · retrieved 2026-09-25T05:11:50.139Z