Two-photon lithography for microlenses: principles and applications.

Mao W, Lei H, Yin Z, Wang K, Ruan Q

DOI: 10.1039/d6nr00485g
Published: 2026 Aug 13
Container: Nanoscale
Publisher: Not recorded
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1039/d6nr00485g,
  title = {Two-photon lithography for microlenses: principles and applications.},
  author = {Mao W and Lei H and Yin Z and Wang K and Ruan Q},
  year = {2026},
  journal = {Nanoscale},
  doi = {10.1039/d6nr00485g},
  url = {https://doi.org/10.1039/d6nr00485g}
}

RIS

TY  - JOUR
TI  - Two-photon lithography for microlenses: principles and applications.
AU  - Mao W
AU  - Lei H
AU  - Yin Z
AU  - Wang K
AU  - Ruan Q
PY  - 2026
JO  - Nanoscale
DO  - 10.1039/d6nr00485g
UR  - https://doi.org/10.1039/d6nr00485g
ER  -

APA

W, M., H, L., Z, Y., K, W., & Q, R. (2026). Two-photon lithography for microlenses: principles and applications.. Nanoscale. https://doi.org/10.1039/d6nr00485g

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pubmed · retrieved 2026-09-25T01:08:31.684Z