Defect annihilation in block copolymer nanopatterning through solvent immersion annealing

Min Seong Kim, Seokyoung Bae, Sang Hyun Choi, So Youn Kim

Open source

DOI: 10.1039/d6nr01356b
Published: 2026
Container: Nanoscale
Publisher: Royal Society of Chemistry (RSC)
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1039/d6nr01356b,
  title = {Defect annihilation in block copolymer nanopatterning through solvent immersion annealing},
  author = {Min Seong Kim and Seokyoung Bae and Sang Hyun Choi and So Youn Kim},
  year = {2026},
  journal = {Nanoscale},
  doi = {10.1039/d6nr01356b},
  url = {https://doi.org/10.1039/d6nr01356b}
}

RIS

TY  - JOUR
TI  - Defect annihilation in block copolymer nanopatterning through solvent immersion annealing
AU  - Min Seong Kim
AU  - Seokyoung Bae
AU  - Sang Hyun Choi
AU  - So Youn Kim
PY  - 2026
JO  - Nanoscale
DO  - 10.1039/d6nr01356b
UR  - https://doi.org/10.1039/d6nr01356b
ER  -

APA

Kim, M. S., Bae, S., Choi, S. H., & Kim, S. Y. (2026). Defect annihilation in block copolymer nanopatterning through solvent immersion annealing. Nanoscale. https://doi.org/10.1039/d6nr01356b

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crossref · retrieved 2026-09-25T01:47:07.418Z