Design of three functionalities in hexameric tin oxide clusters to enhance e-beam lithographic quality and edge resistance ability.

Chen YC, Li CD, Lin BJ, Chen SZ, Chen PH, Chiu PW, Wu TL, Liu RS

Open source

DOI
10.1039/d6nr02551j
Published
2026 Sep 18
Container
Nanoscale
Publisher
Not recorded
Open access
unknown

Credibility signals

limited evidence Score 43/100 under policy 1.0.0. This is a metadata assessment, not a judgment of the paper's conclusions.

Show all credibility signals

Cite this work

BibTeX

@article{allodium:10.1039/d6nr02551j,
  title = {Design of three functionalities in hexameric tin oxide clusters to enhance e-beam lithographic quality and edge resistance ability.},
  author = {Chen YC and Li CD and Lin BJ and Chen SZ and Chen PH and Chiu PW and Wu TL and Liu RS},
  year = {2026},
  journal = {Nanoscale},
  doi = {10.1039/d6nr02551j},
  url = {https://doi.org/10.1039/d6nr02551j}
}

RIS

TY  - JOUR
TI  - Design of three functionalities in hexameric tin oxide clusters to enhance e-beam lithographic quality and edge resistance ability.
AU  - Chen YC
AU  - Li CD
AU  - Lin BJ
AU  - Chen SZ
AU  - Chen PH
AU  - Chiu PW
AU  - Wu TL
AU  - Liu RS
PY  - 2026
JO  - Nanoscale
DO  - 10.1039/d6nr02551j
UR  - https://doi.org/10.1039/d6nr02551j
ER  - 

APA

YC, C., CD, L., BJ, L., SZ, C., PH, C., PW, C., TL, W., & RS, L. (2026). Design of three functionalities in hexameric tin oxide clusters to enhance e-beam lithographic quality and edge resistance ability.. Nanoscale. https://doi.org/10.1039/d6nr02551j

Source records