METALORGANIC CHEMICAL VAPOR DEPOSITION : EXAMPLES OF THE INFLUENCE OF PRECURSOR STRUCTURE ON FILM PROPERTIES

K. F. JENSEN, A. ANNAPRAGADA, K. L. HO, J.-S. HUH, S. PATNAIK, S. SALIM

Open source

DOI
10.1051/jp4:1991230
Published
1991-09
Container
Le Journal de Physique IV
Publisher
EDP Sciences
Open access
unknown

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BibTeX

@article{allodium:10.1051/jp4:1991230,
  title = {METALORGANIC CHEMICAL VAPOR DEPOSITION : EXAMPLES OF THE INFLUENCE OF PRECURSOR STRUCTURE ON FILM PROPERTIES},
  author = {K. F. JENSEN and A. ANNAPRAGADA and K. L. HO and J.-S. HUH and S. PATNAIK and S. SALIM},
  year = {1991},
  journal = {Le Journal de Physique IV},
  doi = {10.1051/jp4:1991230},
  url = {https://doi.org/10.1051/jp4:1991230}
}

RIS

TY  - JOUR
TI  - METALORGANIC CHEMICAL VAPOR DEPOSITION : EXAMPLES OF THE INFLUENCE OF PRECURSOR STRUCTURE ON FILM PROPERTIES
AU  - K. F. JENSEN
AU  - A. ANNAPRAGADA
AU  - K. L. HO
AU  - J.-S. HUH
AU  - S. PATNAIK
AU  - S. SALIM
PY  - 1991
JO  - Le Journal de Physique IV
DO  - 10.1051/jp4:1991230
UR  - https://doi.org/10.1051/jp4:1991230
ER  - 

APA

JENSEN, K. F., ANNAPRAGADA, A., HO, K. L., HUH, J., PATNAIK, S., & SALIM, S. (1991). METALORGANIC CHEMICAL VAPOR DEPOSITION : EXAMPLES OF THE INFLUENCE OF PRECURSOR STRUCTURE ON FILM PROPERTIES. Le Journal de Physique IV. https://doi.org/10.1051/jp4:1991230

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