REACTION KINETICS OF MoSi<sub>2</sub> SILICIDE OBTAINED BY cw LASER ANNEALING OF Si (a) AND Si<sub>poly</sub>/Mo BILAYERS

J. Torres, G. Bomchil, Y. Pauleau, Ph. Lami, G. Auvert

Open source

DOI
10.1051/jphyscol:1983567
Published
1983-10
Container
Le Journal de Physique Colloques
Publisher
EDP Sciences
Open access
unknown

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BibTeX

@article{allodium:10.1051/jphyscol:1983567,
  title = {REACTION KINETICS OF MoSi<sub>2</sub> SILICIDE OBTAINED BY cw LASER ANNEALING OF Si (a) AND Si<sub>poly</sub>/Mo BILAYERS},
  author = {J. Torres and G. Bomchil and Y. Pauleau and Ph. Lami and G. Auvert},
  year = {1983},
  journal = {Le Journal de Physique Colloques},
  doi = {10.1051/jphyscol:1983567},
  url = {https://doi.org/10.1051/jphyscol:1983567}
}

RIS

TY  - JOUR
TI  - REACTION KINETICS OF MoSi<sub>2</sub> SILICIDE OBTAINED BY cw LASER ANNEALING OF Si (a) AND Si<sub>poly</sub>/Mo BILAYERS
AU  - J. Torres
AU  - G. Bomchil
AU  - Y. Pauleau
AU  - Ph. Lami
AU  - G. Auvert
PY  - 1983
JO  - Le Journal de Physique Colloques
DO  - 10.1051/jphyscol:1983567
UR  - https://doi.org/10.1051/jphyscol:1983567
ER  - 

APA

Torres, J., Bomchil, G., Pauleau, Y., Lami, P., & Auvert, G. (1983). REACTION KINETICS OF MoSi<sub>2</sub> SILICIDE OBTAINED BY cw LASER ANNEALING OF Si (a) AND Si<sub>poly</sub>/Mo BILAYERS. Le Journal de Physique Colloques. https://doi.org/10.1051/jphyscol:1983567

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