Morphology and Thermal Stability of Me-Si-N (Me=Re, W, Ta) for Microelectronics

A.-M. Dutron, E. Blanquet, V. Ghetta, R. Madar, C. Bernard

Open source

DOI: 10.1051/jphyscol:19955135
Published: 1995-06
Container: Le Journal de Physique IV
Publisher: EDP Sciences
Open access: unknown

Credibility signals

uncertain Score 64/100 under policy 1.0.0. This is a metadata assessment, not a judgment of the paper's conclusions.

Show all credibility signals

supportingDOI registered: A matching record was returned by Crossref. Source: Crossref; license: CC0 metadata
supportingDOI resolves: A matching record was returned by Crossref. Source: Crossref; license: CC0 metadata
not scoredDirectory of Open Access Journals: No matching DOAJ record was present in this response. No allow-list match; this is not evidence of low credibility. Source: DOAJ; license: CC0
not scoredMEDLINE indexed: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredOpenAlex core source: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredKnown publisher allow-list: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredROR affiliation: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredRetraction Watch retraction: No retraction notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete. Source: Retraction Watch; license: CC BY 4.0
not scoredRetraction Watch expression of concern: No expression of concern notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete. Source: Retraction Watch; license: CC BY 4.0
not scoredRetraction Watch correction: No correction notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete. Source: Retraction Watch; license: CC BY 4.0
not scoredRetraction Watch reinstatement: No reinstatement notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete. Source: Retraction Watch; license: CC BY 4.0
not scoredOpen access status: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredPublication license: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredPublication version: A publication version was supplied but is not scored. Source: Normalized work metadata; license: Caller-provided; provenance license not supplied to scorer
supportingMetadata completeness: All 6 scored descriptive metadata groups are present. Source: Normalized work metadata; license: Caller-provided; provenance license not supplied to scorer

Cite this work

BibTeX

@article{allodium:10.1051/jphyscol:19955135,
  title = {Morphology and Thermal Stability of Me-Si-N (Me=Re, W, Ta) for Microelectronics},
  author = {A.-M. Dutron and E. Blanquet and V. Ghetta and R. Madar and C. Bernard},
  year = {1995},
  journal = {Le Journal de Physique IV},
  doi = {10.1051/jphyscol:19955135},
  url = {https://doi.org/10.1051/jphyscol:19955135}
}

RIS

TY  - JOUR
TI  - Morphology and Thermal Stability of Me-Si-N (Me=Re, W, Ta) for Microelectronics
AU  - A.-M. Dutron
AU  - E. Blanquet
AU  - V. Ghetta
AU  - R. Madar
AU  - C. Bernard
PY  - 1995
JO  - Le Journal de Physique IV
DO  - 10.1051/jphyscol:19955135
UR  - https://doi.org/10.1051/jphyscol:19955135
ER  -

APA

Dutron, A., Blanquet, E., Ghetta, V., Madar, R., & Bernard, C. (1995). Morphology and Thermal Stability of Me-Si-N (Me=Re, W, Ta) for Microelectronics. Le Journal de Physique IV. https://doi.org/10.1051/jphyscol:19955135

Source records

crossref · retrieved 2026-09-25T05:54:00.720Z