Longueur de diffusion des porteurs minoritaires et structure de jonction des diodes Cu/Cu2O

C. Noguet, D. Pierrat, M. Tapiero, J.P. Zielinger

Open source

DOI: 10.1051/rphysap:01980001503059500
Published: 1980
Container: Revue de Physique Appliquée
Publisher: EDP Sciences
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1051/rphysap:01980001503059500,
  title = {Longueur de diffusion des porteurs minoritaires et structure de jonction des diodes Cu/Cu2O},
  author = {C. Noguet and D. Pierrat and M. Tapiero and J.P. Zielinger},
  year = {1980},
  journal = {Revue de Physique Appliquée},
  doi = {10.1051/rphysap:01980001503059500},
  url = {https://doi.org/10.1051/rphysap:01980001503059500}
}

RIS

TY  - JOUR
TI  - Longueur de diffusion des porteurs minoritaires et structure de jonction des diodes Cu/Cu2O
AU  - C. Noguet
AU  - D. Pierrat
AU  - M. Tapiero
AU  - J.P. Zielinger
PY  - 1980
JO  - Revue de Physique Appliquée
DO  - 10.1051/rphysap:01980001503059500
UR  - https://doi.org/10.1051/rphysap:01980001503059500
ER  -

APA

Noguet, C., Pierrat, D., Tapiero, M., & Zielinger, J. (1980). Longueur de diffusion des porteurs minoritaires et structure de jonction des diodes Cu/Cu2O. Revue de Physique Appliquée. https://doi.org/10.1051/rphysap:01980001503059500

Source records

crossref · retrieved 2026-09-26T09:22:34.503Z