Electrical properties of thin anodic silicon dioxide layers grown in pure water

F. Gaspard, A. Halimaoui, G. Sarrabayrouse

Open source

DOI: 10.1051/rphysap:0198700220106500
Published: 1987
Container: Revue de Physique Appliquée
Publisher: EDP Sciences
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1051/rphysap:0198700220106500,
  title = {Electrical properties of thin anodic silicon dioxide layers grown in pure water},
  author = {F. Gaspard and A. Halimaoui and G. Sarrabayrouse},
  year = {1987},
  journal = {Revue de Physique Appliquée},
  doi = {10.1051/rphysap:0198700220106500},
  url = {https://doi.org/10.1051/rphysap:0198700220106500}
}

RIS

TY  - JOUR
TI  - Electrical properties of thin anodic silicon dioxide layers grown in pure water
AU  - F. Gaspard
AU  - A. Halimaoui
AU  - G. Sarrabayrouse
PY  - 1987
JO  - Revue de Physique Appliquée
DO  - 10.1051/rphysap:0198700220106500
UR  - https://doi.org/10.1051/rphysap:0198700220106500
ER  -

APA

Gaspard, F., Halimaoui, A., & Sarrabayrouse, G. (1987). Electrical properties of thin anodic silicon dioxide layers grown in pure water. Revue de Physique Appliquée. https://doi.org/10.1051/rphysap:0198700220106500

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crossref · retrieved 2026-09-25T06:10:09.086Z