Self-consistent circuit model for plasma source ion implantation.

Chung KJ, Jung SW, Choe JM, Kim GH, Hwang YS

DOI: 10.1063/1.2816792
Published: 2008 Feb
Container: The Review of scientific instruments
Publisher: Not recorded
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1063/1.2816792,
  title = {Self-consistent circuit model for plasma source ion implantation.},
  author = {Chung KJ and Jung SW and Choe JM and Kim GH and Hwang YS},
  year = {2008},
  journal = {The Review of scientific instruments},
  doi = {10.1063/1.2816792},
  url = {https://doi.org/10.1063/1.2816792}
}

RIS

TY  - JOUR
TI  - Self-consistent circuit model for plasma source ion implantation.
AU  - Chung KJ
AU  - Jung SW
AU  - Choe JM
AU  - Kim GH
AU  - Hwang YS
PY  - 2008
JO  - The Review of scientific instruments
DO  - 10.1063/1.2816792
UR  - https://doi.org/10.1063/1.2816792
ER  -

APA

KJ, C., SW, J., JM, C., GH, K., & YS, H. (2008). Self-consistent circuit model for plasma source ion implantation.. The Review of scientific instruments. https://doi.org/10.1063/1.2816792

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pubmed · retrieved 2026-09-25T09:18:45.881Z