Self-consistent circuit model for plasma source ion implantation

Kyoung-Jae Chung, Soon-Wook Jung, Jae-Myung Choe, Gon-Ho Kim, Y. S. Hwang

Open source

DOI: 10.1063/1.2816792
Published: 2008-02-01
Container: Review of Scientific Instruments
Publisher: AIP Publishing
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1063/1.2816792,
  title = {Self-consistent circuit model for plasma source ion implantation},
  author = {Kyoung-Jae Chung and Soon-Wook Jung and Jae-Myung Choe and Gon-Ho Kim and Y. S. Hwang},
  year = {2008},
  journal = {Review of Scientific Instruments},
  doi = {10.1063/1.2816792},
  url = {https://doi.org/10.1063/1.2816792}
}

RIS

TY  - JOUR
TI  - Self-consistent circuit model for plasma source ion implantation
AU  - Kyoung-Jae Chung
AU  - Soon-Wook Jung
AU  - Jae-Myung Choe
AU  - Gon-Ho Kim
AU  - Y. S. Hwang
PY  - 2008
JO  - Review of Scientific Instruments
DO  - 10.1063/1.2816792
UR  - https://doi.org/10.1063/1.2816792
ER  -

APA

Chung, K., Jung, S., Choe, J., Kim, G., & Hwang, Y. S. (2008). Self-consistent circuit model for plasma source ion implantation. Review of Scientific Instruments. https://doi.org/10.1063/1.2816792

Source records

crossref · retrieved 2026-11-10T07:00:51.375Z