A spatially resolved retarding field energy analyzer design suitable for uniformity analysis across the surface of a semiconductor wafer.
- DOI
- 10.1063/1.4870900
- Published
- 2014-04-01
- Container
- Rev Sci Instrum
- Publisher
- Not recorded
- Open access
- no
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Cite this work
BibTeX
@article{allodium:10.1063/1.4870900,
title = {A spatially resolved retarding field energy analyzer design suitable for uniformity analysis across the surface of a semiconductor wafer.},
author = {Sharma S and Gahan D and Kechkar S and Daniels S and Hopkins MB.},
year = {2014},
journal = {Rev Sci Instrum},
doi = {10.1063/1.4870900},
url = {https://doi.org/10.1063/1.4870900}
}RIS
TY - JOUR TI - A spatially resolved retarding field energy analyzer design suitable for uniformity analysis across the surface of a semiconductor wafer. AU - Sharma S AU - Gahan D AU - Kechkar S AU - Daniels S AU - Hopkins MB. PY - 2014 JO - Rev Sci Instrum DO - 10.1063/1.4870900 UR - https://doi.org/10.1063/1.4870900 ER -
APA
S, S., D, G., S, K., S, D., & MB., H. (2014). A spatially resolved retarding field energy analyzer design suitable for uniformity analysis across the surface of a semiconductor wafer.. Rev Sci Instrum. https://doi.org/10.1063/1.4870900
Source records
- europe-pmc · retrieved 2026-09-25T18:02:54.148Z